scholarly journals QED Theory of Transition Probabilities and Line Profiles in Highly Charged Ions

2002 ◽  
Vol 302 (1) ◽  
pp. 22-58 ◽  
Author(s):  
L.N. Labzowsky ◽  
A. Prosorov ◽  
A.V. Shonin ◽  
I. Bednyakov ◽  
G. Plunien ◽  
...  
2008 ◽  
Vol 86 (1) ◽  
pp. 111-123 ◽  
Author(s):  
J.R. Crespo López-Urrutia

The observation of forbidden transitions in the visible range was the first experimental sign of the existence of highly charged ions in nature. Such lines can nowadays be excited in electron beam ion traps with excellent control of the ionic charge state, allowing their identification and precise determination of wavelengths and transition probabilities. The accuracy achieved in such experiments has been central to the study of nuclear size effects and quantum electrodynamic contributions, which are drastically magnified in highly charged ions, thus enabling the study of the underlying fundamental interactions in few-electron systems. At the same time, forbidden lines can be used to probe conditions in high temperature plasmas present in both astrophysical and laboratory environments.PACS Nos.: 31.30.Jv, 32.10.Fn, 32.30.Jc, 96.60.Tf, 97.10.Ex, 32.60.+i, 32.70.Cs, 12.20.Fv, 42.50.Xa


Coatings ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 7
Author(s):  
Chin-Chiuan Kuo ◽  
Chun-Hui Lin ◽  
Jing-Tang Chang ◽  
Yu-Tse Lin

The Zr film microstructure is highly influenced by the energy of the plasma species during the deposition process. The influences of the discharge pulse width, which is the key factor affecting ionization of sputtered species in the high-power impulse magnetron sputtering (HiPIMS) process, on the obtained microstructure of films is investigated in this research. The films deposited at different argon pressure and substrate biasing are compared. With keeping the same average HiPIMS power and duty cycle, the film growth rate of the Zr film decreases with increasing argon pressure and enhancing substrate biasing. In addition, the film growth rate decreases with the elongating HiPIMS pulse width. For the deposition at 1.2 Pa argon, extending the pulse width not only intensifies the ion flux toward the substrate but also increases the fraction of highly charged ions, which alter the microstructure of films from individual hexagonal prism columns into a tightly connected irregular column. Increasing film density leads to higher hardness. Sufficient synchronized negative substrate biasing and longer pulse width, which supports higher mobility of adatoms, causes the preferred orientation of hexagonal α-phase Zr films from (0 0 0 2) to (1 0 1¯ 1). Unlike the deposition at 1.2 Pa, highly charged ions are also found during the short HiPIMS pulse width at 0.8 Pa argon.


2015 ◽  
Vol 48 (14) ◽  
pp. 144006 ◽  
Author(s):  
A Gumberidze ◽  
D B Thorn ◽  
C J Fontes ◽  
B Najjari ◽  
H L Zhang ◽  
...  

2005 ◽  
Vol 76 (10) ◽  
pp. 103102 ◽  
Author(s):  
M. Vogel ◽  
D. F. A. Winters ◽  
D. M. Segal ◽  
R. C. Thompson

2004 ◽  
Vol 70 (4) ◽  
Author(s):  
A. L. Landers ◽  
E. Wells ◽  
T. Osipov ◽  
K. D. Carnes ◽  
A. S. Alnaser ◽  
...  

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