Multifluid electrospinning for the generation of complex nanostructures

Author(s):  
Deng‐Guang Yu ◽  
Menglong Wang ◽  
Xiaoyan Li ◽  
Xinkuan Liu ◽  
Li‐Min Zhu ◽  
...  
2018 ◽  
Author(s):  
Julia Sun ◽  
Benjamin Almquist

For decades, fabrication of semiconductor devices has utilized well-established etching techniques to create complex nanostructures in silicon. Of these, two of the most common are reactive ion etching in the gaseous phase and metal-assisted chemical etching (MACE) in the liquid phase. Though these two methods are highly established and characterized, there is a surprising scarcity of reports exploring the ability of metallic films to catalytically enhance the etching of silicon in dry plasmas via a MACE-like mechanism. Here, we discuss a <u>m</u>etal-<u>a</u>ssisted <u>p</u>lasma <u>e</u>tch (MAPE) performed using patterned gold films to catalyze the etching of silicon in an SF<sub>6</sub>/O<sub>2</sub> mixed plasma, selectively increasing the rate of etching by over 1000%. The degree of enhancement as a function of Au catalyst configuration and relative oxygen feed concentration is characterized, along with the catalytic activities of other common MACE metals including Ag, Pt, and Cu. Finally, methods of controlling the etch process are briefly explored to demonstrate the potential for use as a liquid-free fabrication strategy.


CrystEngComm ◽  
2018 ◽  
Vol 20 (38) ◽  
pp. 5844-5856 ◽  
Author(s):  
F. A. Taher ◽  
E. Abdeltwab

Three ferromagnetic complex nanostructures (flower, sheaf, and cactus) of Co-doped ZnO thin films were selectively grown from 1D to 3D.


2009 ◽  
Vol 4 (1/2/3/4) ◽  
pp. 34 ◽  
Author(s):  
Ahmad Umar ◽  
Y.K. Park ◽  
Y.B. Hahn ◽  
A. Al Hajry

2015 ◽  
Vol 44 (4) ◽  
pp. 1889-1899 ◽  
Author(s):  
Mukul Pradhan ◽  
Anindita Roy ◽  
Arun Kumar Sinha ◽  
Ramkrishna Sahoo ◽  
Dibakar Deb ◽  
...  

Solid-state transformation of a vanadium complex to V2O5 and VO2 nanostructures and the catalytic activity of V2O5 for the oxidative coupling of 2-naphthol.


2012 ◽  
Vol 50 (2) ◽  
pp. 297-302 ◽  
Author(s):  
Kan Zhou ◽  
Pingxin Xiong ◽  
Xin Jia ◽  
Shian Zhang ◽  
Donghai Feng ◽  
...  

2019 ◽  
Vol 52 (5) ◽  
pp. 1072-1076 ◽  
Author(s):  
Frederick Marlton ◽  
Oleh Ivashko ◽  
Martin v. Zimmerman ◽  
Olof Gutowski ◽  
Ann-Christin Dippel ◽  
...  

Total scattering and pair distribution function (PDF) analysis has created new insights that traditional powder diffraction methods have been unable to achieve in understanding the local structures of materials exhibiting disorder or complex nanostructures. Care must be taken in such analyses as subtle and discrete features in the PDF can easily be artefacts generated in the measurement process, which can result in unphysical models and interpretation. The focus of this study is an artefact called the parallax effect, which can occur in area detectors with thick detection layers during the collection of X-ray PDF data. This effect results in high-Q peak offsets, which subsequently cause an r-dependent shift in the PDF peak positions in real space. Such effects should be accounted for if a truly accurate model is to be achieved, and a simple correction that can be conducted via a Rietveld refinement against the reference data is proposed.


Sign in / Sign up

Export Citation Format

Share Document