Cost-effective Atomic Layer Deposition Synthesis of Pt Nanotube Arrays: Application for High Performance Supercapacitor

Small ◽  
2014 ◽  
Vol 10 (15) ◽  
pp. 3162-3168 ◽  
Author(s):  
Liaoyong Wen ◽  
Yan Mi ◽  
Chengliang Wang ◽  
Yaoguo Fang ◽  
Fabian Grote ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Performance ◽  
Cost Effective ◽  
Atomic Layer ◽  
Nanotube Arrays ◽  
Layer Deposition

ALD of Pt nanotube arrays supported on a carbon fiber cloth as a high-performance electrocatalyst for methanol oxidation

2016 ◽  
Vol 4 (41) ◽  
pp. 15961-15967 ◽  
Author(s):  
Haifeng Zhang ◽  
Chuanwei Cheng
Keyword(s):  
Carbon Fiber ◽  
Atomic Layer Deposition ◽  
Methanol Oxidation ◽  
High Performance ◽  
Atomic Layer ◽  
Nanotube Arrays ◽  
Layer Deposition ◽  
Carbon Fiber Cloth

Ordered Pt nanotube arrays supported on carbon fiber cloth is fabricated by atomic layer deposition route as electrocatalyst for methanol oxidation.

Depositing High-Performance Conductive Thin Films by Using Atomic Layer Deposition

2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electric Properties ◽  
X Ray Diffraction ◽  
Layer Deposition ◽  
Azo Thin Film ◽  
Aluminum Doped Zinc Oxide ◽  
Conductive Thin Films

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.

Ozone-Based Atomic Layer Deposition of Crystalline V2O5 Films for High Performance Electrochemical Energy Storage

2012 ◽  
Vol 24 (7) ◽  
pp. 1255-1261 ◽  
Author(s):  
Xinyi Chen ◽  
Ekaterina Pomerantseva ◽  
Parag Banerjee ◽  
Keith Gregorczyk ◽  
Reza Ghodssi ◽  
...  
Keyword(s):  
Energy Storage ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electrochemical Energy Storage ◽  
Layer Deposition ◽  
Electrochemical Energy
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