Study on the anti-reflection and structure evolution of hydrogenated amorphous carbon grown by plasma chemical vapor deposition

2014 ◽  
Vol 46 (8) ◽  
pp. 530-534 ◽  
Author(s):  
Jing Shi ◽  
Zhongrong Geng ◽  
Junyan Zhang ◽  
Chengbing Wang
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Structure Evolution ◽  
Plasma Chemical ◽  
Hydrogenated Amorphous Carbon ◽  
Plasma Chemical Vapor Deposition ◽  
Hydrogenated Amorphous

NITROGEN INCORPORATED HYDROGENATED AMORPHOUS CARBON THIN FILMS DEPOSITED BY MICROWAVE SURFACE-WAVE PLASMA CHEMICAL VAPOR DEPOSITION

2009 ◽  
Vol 23 (09) ◽  
pp. 2159-2165 ◽  
Author(s):  
SUDIP ADHIKARI ◽  
MASAYOSHI UMENO
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Surface Wave ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Hydrogenated Amorphous Carbon ◽  
Plasma Chemical Vapor Deposition ◽  
Hydrogenated Amorphous

Nitrogen incorporated hydrogenated amorphous carbon (a-C:N:H) thin films have been deposited by microwave surface-wave plasma chemical vapor deposition on silicon and quartz substrates, using helium, methane and nitrogen ( N 2) as plasma source. The deposited a-C:N:H films were characterized by their optical, structural and electrical properties through UV/VIS/NIR spectroscopy, Raman spectroscopy, atomic force microscope and current-voltage characteristics. The optical band gap decreased gently from 3.0 eV to 2.5 eV with increasing N 2 concentration in the films. The a-C:N:H film shows significantly higher electrical conductivity compared to that of N 2-free a-C:H film.

Effects of Preparation and Thermal Stability on Hydrogenated Amorphous Carbon Films by Microwave Plasma Chemical Vapor Deposition

2014 ◽  
Vol 1048 ◽  
pp. 378-382
Author(s):  
Hai Ying Xu ◽  
Cai Xia Kan ◽  
Feng Ming Pan ◽  
Chang Zong Miao
Keyword(s):  
Thermal Stability ◽  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Hydrogenated Amorphous Carbon ◽  
Plasma Chemical Vapor Deposition ◽  
Hydrogenated Amorphous

Hydrogenated amorphous carbon (a-C:H) films were prepared by microwave plasma chemical vapor deposition (MW-PCVD) technique with a mixture of acetylene and hydrogen. The morphology of three-phase a-C:H films, such as graphite-like, diamond-like and polymer-like were modulated by microwave power, deposition pressure, and flow ratios. Meanwhile, annealing does not seem to change the surface morphology or the film structure. The phase transitions are not found during the different annealing temperatures, showing that a-C:H films have a good thermal stability.

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