TOF-SIMS analysis of lithium air battery discharge products utilizing gas cluster ion beam sputtering for surface stabilization

2014 ◽  
Vol 46 (S1) ◽  
pp. 344-347 ◽  
Author(s):  
Akiya Karen ◽  
Kimihiko Ito ◽  
Yoshimi Kubo
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Surface Stabilization ◽  
Tof Sims ◽  
Beam Sputtering ◽  
Cluster Ion ◽  
Air Battery ◽  
Sims Analysis ◽  
Gas Cluster Ion Beam ◽  
Battery Discharge

Development of an Argon Gas Cluster Ion Beam for ToF‐SIMS Analysis

2019 ◽  
Vol 40 (9) ◽  
pp. 877-881 ◽  
Author(s):  
Sang Ju Lee ◽  
Chang Min Choi ◽  
Boo Ki Min ◽  
Ji Young Baek ◽  
Jae Yeong Eo ◽  
...  
Keyword(s):  
Ion Beam ◽  
Argon Gas ◽  
Tof Sims ◽  
Cluster Ion ◽  
Sims Analysis ◽  
Gas Cluster Ion Beam

GaP/Si(0 0 1) interface study by XPS in combination with Ar gas cluster ion beam sputtering

2020 ◽  
Vol 514 ◽  
pp. 145903 ◽  
Author(s):  
O. Romanyuk ◽  
I. Gordeev ◽  
A. Paszuk ◽  
O. Supplie ◽  
J.P. Stoeckmann ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam ◽  
Ar Gas ◽  
Interface Study

Probing the persistence of energy-level control effects at organic semiconductor/electrode interfaces based on photoemission spectroscopy combined with Ar gas cluster ion beam sputtering

RSC Advances ◽  
2015 ◽  
Vol 5 (95) ◽  
pp. 77814-77822 ◽  
Author(s):  
Dong-Jin Yun ◽  
Taeho Shin ◽  
SungJun Park ◽  
Youngsik Shin ◽  
YongKoo Kyung ◽  
...  
Keyword(s):  
Energy Level ◽  
Organic Semiconductor ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Level Control ◽  
Beam Sputtering ◽  
Cluster Ion ◽  
Semiconductor Electrode ◽  
Gas Cluster Ion Beam ◽  
Ar Gas

Thein situPES – Ar GCIB sputtering combined analysis enable to characterize the persistence of controlled energy-level at organic semiconductor/electrode interfaces.

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