Direct comparative study on the energy level alignments in unoccupied/occupied states of organic semiconductor/electrode interface by constructing in-situ photoemission spectroscopy and Ar gas cluster ion beam sputtering integrated analysis system

2014 ◽  
Vol 116 (15) ◽  
pp. 153702 ◽  
Author(s):  
Dong-Jin Yun ◽  
JaeGwan Chung ◽  
Yongsu Kim ◽  
Sung-Hoon Park ◽  
Seong-Heon Kim ◽  
...  
Keyword(s):  
Ion Beam ◽  
Integrated Analysis ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Cluster Ion ◽  
Electrode Interface ◽  
Analysis System ◽  
Gas Cluster Ion Beam ◽  
Ar Gas

Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering

2018 ◽  
Vol 20 (1) ◽  
pp. 615-622 ◽  
Author(s):  
Dong-Jin Yun ◽  
Seyun Kim ◽  
Changhoon Jung ◽  
Chang-Seok Lee ◽  
Hiesang Sohn ◽  
...  
Keyword(s):  
Ion Beam ◽  
Photoemission Spectroscopy ◽  
Ion Beam Sputtering ◽  
Graphene Doping ◽  
Beam Sputtering ◽  
Diagnosis Method ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam ◽  
Ar Gas

We propose a novel, direct diagnosis method for graphene doping states at organic semiconductor/electrode interfaces by an in situ photoemission spectroscopy method.

scholarly journals Correction: Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering

2018 ◽  
Vol 20 (4) ◽  
pp. 2914-2914
Author(s):  
Dong-Jin Yun ◽  
Seyun Kim ◽  
Changhoon Jung ◽  
Chang-Seok Lee ◽  
Hiesang Sohn ◽  
...  
Keyword(s):  
Ion Beam ◽  
Photoemission Spectroscopy ◽  
Ion Beam Sputtering ◽  
Graphene Doping ◽  
Beam Sputtering ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam ◽  
Ar Gas

Correction for ‘Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering’ by Dong-Jin Yun et al., Phys. Chem. Chem. Phys., 2018, 20, 615–622.

GaP/Si(0 0 1) interface study by XPS in combination with Ar gas cluster ion beam sputtering

2020 ◽  
Vol 514 ◽  
pp. 145903 ◽  
Author(s):  
O. Romanyuk ◽  
I. Gordeev ◽  
A. Paszuk ◽  
O. Supplie ◽  
J.P. Stoeckmann ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam ◽  
Ar Gas ◽  
Interface Study

Probing the persistence of energy-level control effects at organic semiconductor/electrode interfaces based on photoemission spectroscopy combined with Ar gas cluster ion beam sputtering

RSC Advances ◽  
2015 ◽  
Vol 5 (95) ◽  
pp. 77814-77822 ◽  
Author(s):  
Dong-Jin Yun ◽  
Taeho Shin ◽  
SungJun Park ◽  
Youngsik Shin ◽  
YongKoo Kyung ◽  
...  
Keyword(s):  
Energy Level ◽  
Organic Semiconductor ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Level Control ◽  
Beam Sputtering ◽  
Cluster Ion ◽  
Semiconductor Electrode ◽  
Gas Cluster Ion Beam ◽  
Ar Gas

Thein situPES – Ar GCIB sputtering combined analysis enable to characterize the persistence of controlled energy-level at organic semiconductor/electrode interfaces.

Electronic structures of SiO2 thin films via Ar gas cluster ion beam sputtering

2014 ◽  
Vol 46 (S1) ◽  
pp. 58-61 ◽  
Author(s):  
Yong Koo Kyoung ◽  
Jae Gwan Chung ◽  
Hyung Ik Lee ◽  
Dong-Jin Yun ◽  
Jae Cheol Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Electronic Structures ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam ◽  
Ar Gas

Study on the molecular distribution of organic composite films by combining photoemission spectroscopy with argon gas cluster ion beam sputtering

2015 ◽  
Vol 3 (2) ◽  
pp. 276-282 ◽  
Author(s):  
Dong-Jin Yun ◽  
JaeGwan Chung ◽  
Seong Heon Kim ◽  
Yongsu Kim ◽  
Minsu Seol ◽  
...  
Keyword(s):  
Ion Beam ◽  
Composite Films ◽  
Photoemission Spectroscopy ◽  
Distribution Analysis ◽  
Ion Beam Sputtering ◽  
Molecular Distribution ◽  
Beam Sputtering ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam ◽  
Ar Gas

In situ molecular distribution analysis based on photoemission spectroscopy combined with Ar gas cluster ion beam sputtering process.

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