Information depth determination for hard X-ray photoelectron spectroscopy up to 15 keV photoelectron kinetic energy

2008 ◽  
Vol 40 (11) ◽  
pp. 1438-1443 ◽  
Author(s):  
J. Rubio-Zuazo ◽  
G. R. Castro
Keyword(s):  
Kinetic Energy ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Information Depth ◽  
Depth Determination

Determination of the Thickness of Sio2-Layers on Si by X-Ray Analysis and by X-Ray Photoelectron Spectroscopy

1979 ◽  
Vol 23 ◽  
pp. 223-230
Author(s):  
Maria F. Ebel ◽  
H. Ebel ◽  
J. Wernisch
Keyword(s):  
Photoelectron Spectroscopy ◽  
Count Rate ◽  
Silicon Wafers ◽  
Electron Spectrometer ◽  
Si Substrate ◽  
Oxide Layers ◽  
X Ray ◽  
Information Depth ◽  
Pass Through

It is feasible to investigate the thickness of oxide layers on silicon wafers by X-radiation in the 0.1-10 nm thickness range. For example, X-ray photoelectron spectroscopy (XPS) is a well applicable technique, with information depth of a few nm. Fig. 1 presents the principle of this method. An impinging characteristic X-radiation hν (e.g. Al Kα) count rate ejects Si 2p photoelectrons from the Si-substrate (d), with count rate n2, which, on their way to the electron spectrometer, have to pass through the SiOx-interface (c), the SiO2-layer (b) and the contamination overlayer (a), whereas Si 2p photoelectrons ejected from the SiO2-layer, with count rate n2 have just to penetrate the contamination overlayer. The Si 2p electrons originating from the SiOx-interface, for the situation shown in Fig. 1, can be added to the substrate count rate.

Cu in In2 S3 : interdiffusion phenomena analysed by high kinetic energy X-ray photoelectron spectroscopy

2009 ◽  
Vol 206 (5) ◽  
pp. 1059-1062 ◽  
Author(s):  
P. Pistor ◽  
N. Allsop ◽  
W. Braun ◽  
R. Caballero ◽  
C. Camus ◽  
...  
Keyword(s):  
Kinetic Energy ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
High Kinetic Energy ◽  
Interdiffusion Phenomena

Angle-Resolved X-Ray Photoelectron Spectroscopy for the Characterization of GaAs(001) and Inp(001) Surfaces

1987 ◽  
Vol 94 ◽  
Author(s):  
Patrick Alnot ◽  
J. Olivier ◽  
F. Wyczisk
Keyword(s):  
Kinetic Energy ◽  
Electron Scattering ◽  
Photoelectron Spectroscopy ◽  
Cluster Model ◽  
Spherical Wave ◽  
Single Scattering ◽  
Photoemission Spectroscopy ◽  
X Ray ◽  
Quantitative Measurements

ABSTRACTElectron scattering and diffraction in X-ray photoemission spectroscopy (XPS) have been used to characterize GaAs(001) and InP(001) chemically etched surfaces. 6a(3d),As(3d), In(4d) and P(2p) photoelectrons have been observed as a function of polar angles for the two [1–10] and [110] azimuths For kinetic energy range of these photoelectrons the experimental results have been correctly predicted by the single-scattering cluster model with spherical-wave corrections.The problems of quantitative measurements in XPS have been discussed in relation with the diffraction phenomena.

Hard X-ray high kinetic energy photoelectron spectroscopy at the KMC-1 beamline at BESSY

2009 ◽  
Vol 169 (1) ◽  
pp. 221-225 ◽  
Author(s):  
M. Gorgoi ◽  
S. Svensson ◽  
F. Schäfers ◽  
W. Braun ◽  
W. Eberhardt
Keyword(s):  
Kinetic Energy ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
High Kinetic Energy

NIST high throughput variable kinetic energy hard X-ray photoelectron spectroscopy facility

2013 ◽  
Vol 190 ◽  
pp. 193-200 ◽  
Author(s):  
C. Weiland ◽  
A.K. Rumaiz ◽  
P. Lysaght ◽  
B. Karlin ◽  
J.C. Woicik ◽  
...  
Keyword(s):  
Kinetic Energy ◽  
High Throughput ◽  
Photoelectron Spectroscopy ◽  
X Ray

scholarly journals The crystal monochromator beamline KMC-1 at BESSY II

2016 ◽  
Vol 2 ◽  
Author(s):  
Franz Schäfers
Keyword(s):  
High Resolution ◽  
Kinetic Energy ◽  
Energy Range ◽  
Photoelectron Spectroscopy ◽  
Double Crystal ◽  
X Ray ◽  
Double Crystal Monochromator ◽  
High Kinetic Energy

The KMC-1 is a soft x-ray double crystal monochromator beamline for the energy range between 2 and 12 keV. The bending magnet beamline as well as the experiment are under UHV-condition. It incorporates high indexed Si-crystals for high resolution and it is primarily used for HAXPES experiments employing the HIKE (High Kinetic Energy Photoelectron Spectroscopy) chamber.

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