scholarly journals Photochromic Response of Encapsulated Oxygen‐Containing Yttrium Hydride Thin Films

2021 ◽  
pp. 2000608
Author(s):  
Marcos V. Moro ◽  
Sigurbjörn M. Aðalsteinsson ◽  
Tuan. T. Tran ◽  
Dmitrii Moldarev ◽  
Ayan Samanta ◽  
...  
Keyword(s):  
Thin Films ◽  
Yttrium Hydride

Enhanced photochromic response in oxygen-containing yttrium hydride thin films transformed by an oxidation process

2017 ◽  
Vol 166 ◽  
pp. 185-189 ◽  
Author(s):  
Chang Chuan You ◽  
Dmitrii Moldarev ◽  
Trygve Mongstad ◽  
Daniel Primetzhofer ◽  
Max Wolff ◽  
...  
Keyword(s):  
Thin Films ◽  
Oxidation Process ◽  
Yttrium Hydride

scholarly journals Transparent yttrium hydride thin films prepared by reactive sputtering

2011 ◽  
Vol 509 ◽  
pp. S812-S816 ◽  
Author(s):  
T. Mongstad ◽  
C. Platzer-Björkman ◽  
S.Zh. Karazhanov ◽  
A. Holt ◽  
J.P. Maehlen ◽  
...  
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Yttrium Hydride

scholarly journals Photochromic mechanism in oxygen-containing yttrium hydride thin films: An optical perspective

2017 ◽  
Vol 95 (20) ◽  
Author(s):  
J. Montero ◽  
F. A. Martinsen ◽  
M. García-Tecedor ◽  
S. Zh. Karazhanov ◽  
D. Maestre ◽  
...  
Keyword(s):  
Thin Films ◽  
Yttrium Hydride

Dynamic reactive sputtering of photochromic yttrium hydride thin films

2015 ◽  
Vol 143 ◽  
pp. 623-626 ◽  
Author(s):  
Chang Chuan You ◽  
Trygve Mongstad ◽  
Jan Petter Maehlen ◽  
Smagul Karazhanov
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Yttrium Hydride

scholarly journals Surface oxide on thin films of yttrium hydride studied by neutron reflectometry

2012 ◽  
Vol 100 (19) ◽  
pp. 191604 ◽  
Author(s):  
T. Mongstad ◽  
C. Platzer-Björkman ◽  
J. P. Mæhlen ◽  
B. C. Hauback ◽  
S. Zh. Karazhanov ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Oxide ◽  
Neutron Reflectometry ◽  
Yttrium Hydride

scholarly journals Engineering of the band gap and optical properties of thin films of yttrium hydride

2014 ◽  
Vol 105 (3) ◽  
pp. 031910 ◽  
Author(s):  
Chang Chuan You ◽  
Trygve Mongstad ◽  
Jan Petter Maehlen ◽  
Smagul Karazhanov
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Band Gap ◽  
Yttrium Hydride

Solid-State NMR Studies of the Photochromic Effects of Thin Films of Oxygen-Containing Yttrium Hydride

2014 ◽  
Vol 118 (40) ◽  
pp. 22935-22942 ◽  
Author(s):  
C. Vinod Chandran ◽  
Herman Schreuders ◽  
Bernard Dam ◽  
Johannes W. G. Janssen ◽  
Jacob Bart ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Solid State Nmr ◽  
Nmr Studies ◽  
Yttrium Hydride

The study of interfacial reactions of nickel thin films on GaAs

1983 ◽  
Vol 41 ◽  
pp. 156-157
Author(s):  
L.J. Chen ◽  
Y.F. Hsieh
Keyword(s):  
Thin Films ◽  
Integrated Circuits ◽  
Interfacial Reactions ◽  
Metal Contacts ◽  
Nickel Thin Films ◽  
Thin Foils ◽  
The Status ◽  
Si Doped ◽  
Electron Microscopes

One measure of the maturity of a device technology is the ease and reliability of applying contact metallurgy. Compared to metal contact of silicon, the status of GaAs metallization is still at its primitive stage. With the advent of GaAs MESFET and integrated circuits, very stringent requirements were placed on their metal contacts. During the past few years, extensive researches have been conducted in the area of Au-Ge-Ni in order to lower contact resistances and improve uniformity. In this paper, we report the results of TEM study of interfacial reactions between Ni and GaAs as part of the attempt to understand the role of nickel in Au-Ge-Ni contact of GaAs.N-type, Si-doped, (001) oriented GaAs wafers, 15 mil in thickness, were grown by gradient-freeze method. Nickel thin films, 300Å in thickness, were e-gun deposited on GaAs wafers. The samples were then annealed in dry N2 in a 3-zone diffusion furnace at temperatures 200°C - 600°C for 5-180 minutes. Thin foils for TEM examinations were prepared by chemical polishing from the GaA.s side. TEM investigations were performed with JE0L- 100B and JE0L-200CX electron microscopes.

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