Blanket and patterned growth of CdTe on (211)Si substrates by metal-organic vapor phase epitaxy

2012 ◽  
Vol 9 (8-9) ◽  
pp. 1712-1715 ◽  
Author(s):  
Ishwara B. Bhat ◽  
Sunil R. Rao ◽  
Shashidhar Shintri ◽  
Randolph N. Jacobs
2003 ◽  
Vol 32 (7) ◽  
pp. 728-732 ◽  
Author(s):  
M. Niraula ◽  
K. Yasuda ◽  
T. Ishiguro ◽  
Y. Kawauchi ◽  
H. Morishita ◽  
...  

1991 ◽  
Vol 30 (Part 1, No. 3) ◽  
pp. 451-453 ◽  
Author(s):  
Mitsuru Imaizumi ◽  
Takashi Saka ◽  
Takashi Jimbo ◽  
Tetsuo Soga ◽  
Masayoshi Umeno

1995 ◽  
Vol 417 ◽  
Author(s):  
J. S. Lee ◽  
J. Salzman ◽  
D. Emerson ◽  
J. R. Shealy ◽  
J. M. Ballantyne

AbstractExtremely flat layers of GaP were grown on 4° miscut (100) Si substrates by selective Metal- Organic Vapor Phase Epitaxy. An enhancement of Re@3 was measured at the growth edges, which corresponds to a Sherwood number of 12.5. Defect-free growth is obtained at the edge of the silicon nitride mask. A gradual transition to growth with a large defect density is observed with increasing distance from the mask edges. In the defect free areas, a recovery of the (100) crystal plane is consistently measured on top of the grown mesas. This seems to indicate a pure layer-bylayer homoepitaxial mode (Frank-van der Merve mode) after the island mode nucleation (Volmer- Weber mode) on Silicon is completed, forming a thin smooth seed layer. High Resolution TEM shows a uniform Si-GaP transition. Micro-Raman Spectroscopy with spatial resolution of ˜1 micrometer was performed to assess the crystal quality as a function of the distance from the growth edge.


2008 ◽  
Vol 1 ◽  
pp. 071102 ◽  
Author(s):  
Tomonari Shioda ◽  
Masakazu Sugiyama ◽  
Yukihiro Shimogaki ◽  
Yoshiaki Nakano

2010 ◽  
Vol 49 (10) ◽  
pp. 101001 ◽  
Author(s):  
Kimihito Ooyama ◽  
Katsuya Sugawara ◽  
Shinya Okuzaki ◽  
Hiroyuki Taketomi ◽  
Hideto Miyake ◽  
...  

2004 ◽  
Vol 267 (1-2) ◽  
pp. 140-144 ◽  
Author(s):  
A. Dadgar ◽  
N. Oleynik ◽  
D. Forster ◽  
S. Deiter ◽  
H. Witek ◽  
...  

2011 ◽  
Vol 23 (12) ◽  
pp. 774-776 ◽  
Author(s):  
A B Krysa ◽  
D G Revin ◽  
J P Commin ◽  
C N Atkins ◽  
K Kennedy ◽  
...  

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