Light management in planar silicon heterojunction solar cells via nanocrystalline silicon oxide films and nano-imprint textures

2016 ◽  
Vol 213 (7) ◽  
pp. 1976-1982 ◽  
Author(s):  
Alexei Richter ◽  
Florian Lentz ◽  
Matthias Meier ◽  
Friedhelm Finger ◽  
Kaining Ding
Keyword(s):  
Solar Cells ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Nanocrystalline Silicon ◽  
Heterojunction Solar Cells ◽  
Planar Silicon ◽  
Light Management ◽  
Silicon Heterojunction Solar Cells ◽  
Nano Imprint

scholarly journals Nanocrystalline silicon oxide stacks for silicon heterojunction solar cells for hot climates

2018 ◽  
Author(s):  
Jan Haschke ◽  
Raphaël Monnard ◽  
Luca Antognini ◽  
Jean Cattin ◽  
Amir A. Abdallah ◽  
...  
Keyword(s):  
Solar Cells ◽  
Silicon Oxide ◽  
Nanocrystalline Silicon ◽  
Heterojunction Solar Cells ◽  
Silicon Heterojunction Solar Cells

p-type nc-SiOx:H emitter layer for silicon heterojunction solar cells grown by rf-PECVD

2015 ◽  
Vol 1770 ◽  
pp. 7-12 ◽  
Author(s):  
Henriette A. Gatz ◽  
Yinghuan Kuang ◽  
Marcel A. Verheijen ◽  
Jatin K. Rath ◽  
Wilhelmus M.M. (Erwin) Kessels ◽  
...  
Keyword(s):  
Solar Cells ◽  
Amorphous Silicon ◽  
Material Properties ◽  
Crystalline Silicon ◽  
Silicon Layer ◽  
Nanocrystalline Silicon ◽  
Emitter Layer ◽  
Heterojunction Solar Cells ◽  
P Type ◽  
Silicon Heterojunction Solar Cells

ABSTRACTSilicon heterojunction solar cells (SHJ) with thin intrinsic layers are well known for their high efficiencies. A promising way to further enhance their excellent characteristics is to enable more light to enter the crystalline silicon (c-Si) absorber of the cell while maintaining a simple cell configuration. Our approach is to replace the amorphous silicon (a-Si:H) emitter layer with a more transparent nanocrystalline silicon oxide (nc-SiOx:H) layer. In this work, we focus on optimizing the p-type nc-SiOx:H material properties, grown by radio frequency plasma enhanced chemical vapor deposition (rf PECVD), on an amorphous silicon layer.20 nm thick nanocrystalline layers were successfully grown on a 5 nm a-Si:H layer. The effect of different ratios of trimethylboron to silane gas flow rates on the material properties were investigated, yielding an optimized material with a conductivity in the lateral direction of 7.9×10-4 S/cm combined with a band gap of E04 = 2.33 eV. Despite its larger thickness as compared to a conventional window a-Si:H p-layer, the novel layer stack of a-Si:H(i)/nc-SiOx:H(p) shows significantly enhanced transmission compared to the stack with a conventional a-Si:H(p) emitter. Altogether, the chosen material exhibits promising characteristics for implementation in SHJ solar cells.

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