Molecular beam deposition and characterization of thin organic films on metals for applications in organic electronics

2008 ◽  
Vol 205 (3) ◽  
pp. 497-510 ◽  
Author(s):  
G. Witte ◽  
Ch. Wöll
Keyword(s):  
Organic Electronics ◽  
Molecular Beam ◽  
Organic Films ◽  
Molecular Beam Deposition ◽  
Thin Organic Films ◽  
Beam Deposition

Spectroscopic Characterization of Inorganic Host:Organic Dopant Films Fabricated via Laser-Assisted Molecular Beam Deposition

1996 ◽  
Vol 100 (25) ◽  
pp. 10707-10709 ◽  
Author(s):  
R. L. DeLeon ◽  
W. M. K. P. Wijekoon ◽  
U. Narang ◽  
M. L. Hall ◽  
P. N. Prasad ◽  
...  
Keyword(s):  
Molecular Beam ◽  
Spectroscopic Characterization ◽  
Molecular Beam Deposition ◽  
Beam Deposition

Structural Characterization of Fullerene thin Films Fabricated by Organic Molecular Beam Deposition

1994 ◽  
Vol 359 ◽  
Author(s):  
Kiyoshi Yase ◽  
Takuya Saraya ◽  
Kazuhiro Kudo
Keyword(s):  
Molecular Beam ◽  
Substrate Surface ◽  
Alkali Halides ◽  
Thin Solid Films ◽  
Solid Films ◽  
Molecular Beam Deposition ◽  
Temperature Controlled ◽  
Beam Deposition ◽  
Deposition Conditions

ABSTRACTFullerene C60 thin solid films have been fabricated on the (001) surfaces of alkali halides (NaCl, KCI and KBr) and muscovite by organic molecular beam deposition (OMBD) technique. Pure C60 powder was sublimated from the precisely temperature-controlled K-cell at low pressure (10−7 Torr) and deposited onto the substrates kept in the range 125 –300 °C. Increasing both the temperature of K-cell and the substrate temperature, fine crystals grow with different size, shape and distance between neighbors. The dependence of the size and density of island crystals on the deposition conditions revealed the mechanism of crystal growth and the effect of interaction between molecules and substrate surface.

In situ X-ray characterization of oligophenylene thin films prepared by organic molecular beam deposition

1998 ◽  
Vol 130-132 ◽  
pp. 651-657 ◽  
Author(s):  
Yuji Yoshida ◽  
Hiroshi Takiguchi ◽  
Takeshi Hanada ◽  
Nobutaka Tanigaki ◽  
Eun Mi Han ◽  
...  
Keyword(s):  
Thin Films ◽  
Molecular Beam ◽  
X Ray ◽  
Molecular Beam Deposition ◽  
Beam Deposition

Structural and electrical characterization of pentacene films on SiO2 grown by molecular beam deposition

2004 ◽  
Vol 464-465 ◽  
pp. 398-402 ◽  
Author(s):  
Hirotomo Yanagisawa ◽  
Tsuyoshi Tamaki ◽  
Masakazu Nakamura ◽  
Kazuhiro Kudo
Keyword(s):  
Molecular Beam ◽  
Electrical Characterization ◽  
Molecular Beam Deposition ◽  
Beam Deposition

scholarly journals Characterization of high-κ LaLuO3 thin film grown on AlGaN/GaN heterostructure by molecular beam deposition

2011 ◽  
Vol 99 (18) ◽  
pp. 182103 ◽  
Author(s):  
Shu Yang ◽  
Sen Huang ◽  
Hongwei Chen ◽  
Michael Schnee ◽  
Qing-Tai Zhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Molecular Beam ◽  
Molecular Beam Deposition ◽  
Gan Heterostructure ◽  
Beam Deposition

Preparation and Characterization of 3,4,9,10-Perylenetetracarboxylic dianhydride (PTCDA) Films Deposited by Organic Molecular Beam Deposition Method

1995 ◽  
Vol 34 (Part 1, No. 7B) ◽  
pp. 3852-3857 ◽  
Author(s):  
Hiroyuki Fuchigami ◽  
Sachiko Tanimura ◽  
Yasushi Uehara ◽  
Tetsuyuki Kurata ◽  
Sei Tsunoda
Keyword(s):  
Molecular Beam ◽  
Deposition Method ◽  
Molecular Beam Deposition ◽  
Beam Deposition
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