Insights in the initiation and termination of poly(alkyl acrylates) synthesized by atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD)

François Loyer; Giuseppe Bengasi; Gilles Frache; Patrick Choquet; Nicolas D. Boscher

doi:10.1002/ppap.201800027

Insights in the initiation and termination of poly(alkyl acrylates) synthesized by atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD)

Plasma Processes and Polymers ◽

10.1002/ppap.201800027 ◽

2018 ◽

Vol 15 (5) ◽

pp. 1800027 ◽

Cited By ~ 8

Author(s):

François Loyer ◽

Giuseppe Bengasi ◽

Gilles Frache ◽

Patrick Choquet ◽

Nicolas D. Boscher

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Alkyl Acrylates ◽

Pressure Plasma ◽

Initiated Chemical Vapor Deposition

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Atmospheric Pressure Plasma-Initiated Chemical Vapor Deposition (AP-PiCVD) of Poly(alkyl acrylates): An Experimental Study

Macromolecules ◽

10.1021/acs.macromol.7b00461 ◽

2017 ◽

Vol 50 (11) ◽

pp. 4351-4362 ◽

Cited By ~ 20

Author(s):

François Loyer ◽

Gilles Frache ◽

Patrick Choquet ◽

Nicolas D. Boscher

Keyword(s):

Experimental Study ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Alkyl Acrylates ◽

Pressure Plasma ◽

Initiated Chemical Vapor Deposition

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Atmospheric Pressure Plasma-Initiated Chemical Vapor Deposition (AP-PiCVD) of Poly(diethylallylphosphate) Coating: A Char-Forming Protective Coating for Cellulosic Textile

ACS Applied Materials & Interfaces ◽

10.1021/am504892q ◽

2014 ◽

Vol 6 (21) ◽

pp. 18418-18422 ◽

Cited By ~ 23

Author(s):

Florian Hilt ◽

Nicolas D. Boscher ◽

David Duday ◽

Nicolas Desbenoit ◽

Joëlle Levalois-Grützmacher ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Protective Coating ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Pressure Plasma ◽

Initiated Chemical Vapor Deposition

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Atmospheric Pressure Plasma Initiated Chemical Vapor Deposition Using Ultra-Short Square Pulse Dielectric Barrier Discharge

Plasma Processes and Polymers ◽

10.1002/ppap.201400094 ◽

2014 ◽

Vol 12 (1) ◽

pp. 66-74 ◽

Cited By ~ 27

Author(s):

Nicolas D. Boscher ◽

Florian Hilt ◽

David Duday ◽

Gilles Frache ◽

Thierry Fouquet ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Dielectric Barrier Discharge ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Barrier Discharge ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Dielectric Barrier ◽

Pressure Plasma ◽

Initiated Chemical Vapor Deposition

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Electrical Characteristics of Magnesium Doped a-IGZO RRAM: Chemical Vapor Deposition using Enhanced Atmospheric Pressure-Plasma

2020 IEEE Eurasia Conference on IOT, Communication and Engineering (ECICE) ◽

10.1109/ecice50847.2020.9301987 ◽

2020 ◽

Author(s):

Chien-Hung Wu ◽

Song-Nian Kuo ◽

Yi-Ming Chen ◽

Kow-Ming Chang ◽

Yu Yang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Electrical Characteristics ◽

Pressure Plasma

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Atmospheric‐pressure plasma‐enhanced chemical vapor deposition of nanocomposite thin films from ethyl lactate and silica nanoparticles

Plasma Processes and Polymers ◽

10.1002/ppap.202000153 ◽

2020 ◽

Author(s):

Natalia Milaniak ◽

Gaétan Laroche ◽

Françoise Massines

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silica Nanoparticles ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Ethyl Lactate ◽

Pressure Plasma ◽

Nanocomposite Thin Films

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Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of Borophosphosilicate Glass Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.1735 ◽

2008 ◽

Vol 47 (3) ◽

pp. 1735-1739 ◽

Cited By ~ 4

Author(s):

Minghui Yin ◽

Lingli Zhao ◽

Xiangyu Xu ◽

Shouguo Wang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Pressure Plasma ◽

Borophosphosilicate Glass ◽

Glass Films

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Surface modification of PDMS by atmospheric-pressure plasma-enhanced chemical vapor deposition and analysis of long-lasting surface hydrophilicity

Sensors and Actuators B Chemical ◽

10.1016/j.snb.2011.12.017 ◽

2012 ◽

Vol 162 (1) ◽

pp. 425-434 ◽

Cited By ~ 43

Author(s):

Donghee Lee ◽

Sung Yang

Keyword(s):

Surface Modification ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Surface Hydrophilicity ◽

Pressure Plasma

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Synthesis of SiOC(–H) Films by the Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Method

e-Journal of Surface Science and Nanotechnology ◽

10.1380/ejssnt.2015.445 ◽

2015 ◽

Vol 13 (0) ◽

pp. 445-450 ◽

Cited By ~ 3

Author(s):

Takanori Mori ◽

Taiki Masuko ◽

Akira Shirakura ◽

Tetsuya Suzuki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Pressure Plasma

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Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.3592 ◽

2006 ◽

Vol 45 (4B) ◽

pp. 3592-3597 ◽

Cited By ~ 15

Author(s):

Kiyoshi Yasutake ◽

Hiromasa Ohmi ◽

Hiroaki Kakiuchi ◽

Takuya Wakamiya ◽

Heiji Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma ◽

Si Films

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Atmospheric-pressure plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an atmospheric pressure plasma jet

Thin Solid Films ◽

10.1016/j.tsf.2012.11.100 ◽

2013 ◽

Vol 532 ◽

pp. 36-43 ◽

Cited By ~ 10

Author(s):

Yung-Sen Lin ◽

Di-Jiun Lin ◽

Ping-Ju Sung ◽

Shih-Wei Tien

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Oxide Thin Films ◽

Pressure Plasma

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