Insights into the Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition of Thin Films from Methyldisiloxane Precursors

2012 ◽  
Vol 9 (11-12) ◽  
pp. 1132-1143 ◽  
Author(s):  
Fiorenza Fanelli ◽  
Sara Lovascio ◽  
Riccardo d'Agostino ◽  
Francesco Fracassi
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