HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness
2011 ◽
Vol 8
(12)
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pp. 1184-1195
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2011 ◽
Vol 14
(10)
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pp. H408
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2013 ◽
Vol 133
(3)
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pp. 144-145
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2019 ◽
Vol 139
(7)
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pp. 217-218
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2006 ◽
Vol 10
(2)
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pp. 207-218
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Keyword(s):
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2007 ◽
Vol 11
(4)
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pp. 593-600
2020 ◽
Vol 25
(2)
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pp. 171-185
2008 ◽
Vol 23
(3)
◽
pp. 515-518
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