Mechanism of multiple dielectric loss peaks in dilute solution

2007 ◽  
Vol 14 (1) ◽  
pp. 29-32 ◽  
Author(s):  
W. H. Stockmayer
Author(s):  
P. Pradère ◽  
J.F. Revol ◽  
R. St. John Manley

Although radiation damage is the limiting factor in HREM of polymers, new techniques based on low dose imaging at low magnification have permitted lattice images to be obtained from very radiation sensitive polymers such as polyethylene (PE). This paper describes the computer averaging of P4MP1 lattice images. P4MP1 is even more sensitive than PE (total end point dose of 27 C m-2 as compared to 100 C m-2 for PE at 120 kV). It does, however, have the advantage of forming flat crystals from dilute solution and no change in d-spacings is observed during irradiation.Crystals of P4MP1 were grown at 60°C in xylene (polymer concentration 0.05%). Electron microscopy was performed with a Philips EM 400 T microscope equipped with a Low Dose Unit and operated at 120 kV. Imaging conditions were the same as already described elsewhere. Enlarged micrographs were digitized and processed with the Spider image processing system.


Author(s):  
Sengshiu Chung ◽  
Peggy Cebe

We are studying the crystallization and annealing behavior of high performance polymers, like poly(p-pheny1ene sulfide) PPS, and poly-(etheretherketone), PEEK. Our purpose is to determine whether PPS, which is similar in many ways to PEEK, undergoes reorganization during annealing. In an effort to address the issue of reorganization, we are studying solution grown single crystals of PPS as model materials.Observation of solution grown PPS crystals has been reported. Even from dilute solution, embrionic spherulites and aggregates were formed. We observe that these morphologies result when solutions containing uncrystallized polymer are cooled. To obtain samples of uniform single crystals, we have used two-stage self seeding and solution replacement techniques.


1985 ◽  
Vol 46 (C10) ◽  
pp. C10-565-C10-568
Author(s):  
M. WELLER ◽  
C. A. WERT ◽  
D. SCHLEE
Keyword(s):  

2015 ◽  
Vol 9 (1) ◽  
pp. 566-570
Author(s):  
Zhang Ji ◽  
Jianfeng Zheng

Precise measurement of dielectric loss angle is very important for electric capacity equipment in recent power systems. When signal-to-noise is low and fundamental frequency is fluctuating, aiming at the measuring error of dielectric loss angle based on some recent Fourier transform and wavelet transform harmonics analysis method, we propose a novel algorithm based on sparse representation, and improved it to be more flexible for signal sampling. Comparison experiments describe the advantages of our method.


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