scholarly journals Pore size distributions in low-k dielectric thin films from X-ray porosimetry

2002 ◽  
Vol 40 (19) ◽  
pp. 2170-2177 ◽  
Author(s):  
Hae-Jeong Lee ◽  
Christopher L. Soles ◽  
Da-Wei Liu ◽  
Barry J. Bauer ◽  
Wen-Li Wu
Keyword(s):  
Thin Films ◽  
Pore Size ◽  
Size Distributions ◽  
Dielectric Thin Films ◽  
X Ray ◽  
Pore Size Distributions ◽  
Low K

A New X-Ray Scattering Method for Determining Pore-Size Distribution in Low-k Thin Films

2001 ◽  
Vol 714 ◽  
Author(s):  
Kazuhiko Omote ◽  
Shigeru Kawamura
Keyword(s):  
Thin Films ◽  
Pore Size Distribution ◽  
Pore Size ◽  
Gas Adsorption ◽  
Size Distributions ◽  
X Ray ◽  
X Ray Scattering ◽  
Pore Size Distributions ◽  
Scattering Technique ◽  
Ray Scattering

ABSTRACTWe have successively developed a new x-ray scattering technique for a non-destructive determination of pore-size distributions in porous low-κ thin films formed on thick substrates. The pore size distribution in a film is derived from x-ray diffuse scattering data, which are measured using offset θ/2θ scans to avoid strong specular reflections from the film surface and its substrate. Γ-distribution mode for the pores in the film is used in the calculation. The average diameter and the dispersion parameter of the Γ-distribution function are varied and refined by computer so that the calculated scattering pattern best matches to the experimental pattern. The technique has been used to analyze porous methyl silsesquioxane (MSQ) films. The pore size distributions determined by the x-ray scattering technique agree with that of the commonly used gas adsorption technique. The x-ray technique has been also used successfully determine small pores less than one nanometer in diameter, which is well below the lowest limit of the gas adsorption technique.

Studies of the Coefficient of Thermal Expansion of Low-k ILD Materials by X-Ray Reflectivity

2006 ◽  
Vol 914 ◽  
Author(s):  
George Andrew Antonelli ◽  
Tran M. Phung ◽  
Clay D. Mortensen ◽  
David Johnson ◽  
Michael D. Goodner ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Expansion ◽  
Coefficient Of Thermal Expansion ◽  
Chemical Vapor ◽  
Dielectric Materials ◽  
Free Standing ◽  
Dielectric Thin Films ◽  
X Ray ◽  
Chemical Vapor Deposited ◽  
Low K

AbstractThe electrical and mechanical properties of low-k dielectric materials have received a great deal of attention in recent years; however, measurements of thermal properties such as the coefficient of thermal expansion remain minimal. This absence of data is due in part to the limited number of experimental techniques capable of measuring this parameter. Even when data does exist, it has generally not been collected on samples of a thickness relevant to current and future integrated processes. We present a procedure for using x-ray reflectivity to measure the coefficient of thermal expansion of sub-micron dielectric thin films. In particular, we elucidate the thin film mechanics required to extract this parameter for a supported film as opposed to a free-standing film. Results of measurements for a series of plasma-enhanced chemical vapor deposited and spin-on low-k dielectric thin films will be provided and compared.

Pore size distributions in nanoporous methyl silsesquioxane films as determined by small angle x-ray scattering

2002 ◽  
Vol 81 (12) ◽  
pp. 2232-2234 ◽  
Author(s):  
E. Huang ◽  
M. F. Toney ◽  
W. Volksen ◽  
D. Mecerreyes ◽  
P. Brock ◽  
...  
Keyword(s):  
Pore Size ◽  
Small Angle ◽  
Size Distributions ◽  
X Ray ◽  
X Ray Scattering ◽  
Pore Size Distributions ◽  
Methyl Silsesquioxane ◽  
Ray Scattering

scholarly journals Porogen Effect of Solvents on Pore Size Distribution of Solvent-Casted Polycaprolactone Thin Films

2018 ◽  
Vol 1 (4) ◽  
Author(s):  
Fariba Safaei ◽  
Shahla Khalili ◽  
Saied Nouri Khorasani ◽  
Laleh Ghasemi-Mobarakeh ◽  
Rasoul Esmaeely Neisiany
Keyword(s):  
Thin Films ◽  
Pore Size Distribution ◽  
Pore Size ◽  
Size Distribution ◽  
Methylene Chloride ◽  
Size Distributions ◽  
Solvent Casting ◽  
Casting Method ◽  
Effect Of Solvents ◽  
Pore Size Distributions

In this study, the effect of porogenic solvents on pore size distribution of the polycaprolactone (PCL) thin films was investigated. Five thin PCL films were prepared using the solvent-casting method. Chloroform, Methylene Chloride (MC) and three different compositions of MC/ Dimethylformamide (DMF) (80/20, 50/50 and 20/80) were used as solvents. Scanning Electron Microscopy (SEM) investigations were employed to study morphology and consequently the pore size distribution of the prepared films. The PCL films made by chloroform and MC as a solvent were completely non-porous. Whereas the other films (made by a combination of MC and DMF) showed both uni-modal and bi-modal pore size distributions.

Sign in / Sign up

Export Citation Format

Share Document