Cruickshank, Juretschke und Kato: P. P. Ewald and his Dynamical Theory of X-ray Diffraction/Weinberg: Der Traum von der Einheit des Universums/Rudden u. Wilson: Elements of Solid State Physics/Ebeling: Integrated Optoelectronics/Haken u. Wolf: Molekülphys

1994 ◽  
Vol 50 (2) ◽  
pp. 175-179
Author(s):  
G. Hildebrandt ◽  
H. Fritzsch ◽  
C. Enss ◽  
H. Venghaus ◽  
P. Reineker ◽  
...  
Keyword(s):  
State Physics ◽  
Solid State ◽  
Dynamical Theory ◽  
X Ray Diffraction ◽  
Integrated Optoelectronics ◽  
Solid State Physics ◽  
X Ray

scholarly journals Femtosecond X-ray diffraction applications to biology and solid-state physics

2002 ◽  
Vol 58 (s1) ◽  
pp. c225-c225
Author(s):  
D. Boschetto ◽  
C. Rischel ◽  
S. Fourmaux ◽  
I. Uschmann ◽  
O. Albert ◽  
...  
Keyword(s):  
State Physics ◽  
Solid State ◽  
X Ray Diffraction ◽  
Solid State Physics ◽  
X Ray

Chemistry and Solid State Physics of Microcrystalline Silicon

1989 ◽  
Vol 164 ◽  
Author(s):  
Stan Vepřek
Keyword(s):  
State Physics ◽  
Nanocrystalline Silicon ◽  
Deposition Process ◽  
X Ray Diffraction ◽  
Microcrystalline Silicon ◽  
Large Area ◽  
Solid State Physics ◽  
X Ray ◽  
Partial Chemical ◽  
Microcrystalline Material

AbstractVarious methods for the preparation of microcrystalline (nanocrystalline) silicon are summarized and compared with respect to the possibility of the control of the materials quality and scaling of the deposition process to large area applications. It is shown that the deposition of a pure microcrystalline material is achieved under conditions close to partial chemical equilibrium. The mechanism of the crystallization during the growth will be briefly discussed.The second part of the paper deals with the physical properties of pure microcrystalline silicon which is free of any amorphous phase detectable by X-ray diffraction, i.e. less than about 1 vol%. Several aspects of electric conductivity, optical absorption and Raman scattering which have been frequently misinterpreted in the literature will be reviewed.

scholarly journals New Applications of X-Ray Standing-Wave Fields to Solid State Physics

1976 ◽  
Vol 37 (17) ◽  
pp. 1141-1145 ◽  
Author(s):  
S. Kjaer Andersen ◽  
J. A. Golovchenko ◽  
G. Mair
Keyword(s):  
State Physics ◽  
Solid State ◽  
Standing Wave ◽  
Solid State Physics ◽  
Wave Fields ◽  
X Ray ◽  
New Applications

The Collagenic Molecular Structural Unit of Solid State Complexes

1971 ◽  
Vol 29 ◽  
pp. 478-479
Author(s):  
Kenneth M. Richter ◽  
John A. Schilling
Keyword(s):  
Molecular Weight ◽  
Solid State ◽  
Structural Unit ◽  
X Ray Diffraction ◽  
X Ray ◽  
Naoh Treatment

The structural unit of solid state collagen complexes has been reported by Porter and Vanamee via EM and by Cowan, North and Randall via x-ray diffraction to be an ellipsoidal unit of 210-270 A. length by 50-100 A. diameter. It subsequently was independently demonstrated by us in dog tendon, dermis, and induced complexes. Its detailed morphologic, dimensional and molecular weight (MW) aspects have now been determined. It is pear-shaped in long profile with m diameters of 57 and 108 A. and m length of 263 A. (Fig. 1, tendon, KMnO4 fixation, Na-tungstate; Fig. 2a, schematic of unit in long, C, and x-sectional profiles of its thin, xB, and bulbous, xA portions; Fig. 2b, tendon essentially unmodified by ether and 0.4 N NaOH treatment, Na-tungstate). The unit consists of a uniquely coild cable, c, of ṁ 22.9 A. diameter and length of 2580-3316 A. The cable consists of three 2nd-strands, s, each of m 10.6 A.

TEM studies of solid-state reactions in sputter-deposited Nb/Al multilayer thin films

1996 ◽  
Vol 54 ◽  
pp. 1020-1021
Author(s):  
F. Ma ◽  
S. Vivekanand ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Stoichiometric Composition ◽  
Analytical Electron Microscopy ◽  
Grain Structure ◽  
Solid State Reactions ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sputter Deposited

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.

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