A novel positive resist for deep UV lithography

1989 ◽  
Vol 29 (13) ◽  
pp. 856-858 ◽  
Author(s):  
Tsuguo Yamaoka ◽  
Masashi Nishiki ◽  
Ken'Ichi Koseki ◽  
Mitsunobu Koshiba
Keyword(s):  
Uv Lithography ◽  
Deep Uv ◽  
Positive Resist

Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

1996 ◽  
Author(s):  
Yasunobu Onishi ◽  
Kazuo Sato ◽  
Kenzi Chiba ◽  
Masafumi Asano ◽  
Hirokazu Niki ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Positive Resist

scholarly journals A Novel Positive Resist for Deep UV Lithography

1988 ◽  
Vol 1 (1) ◽  
pp. 102-103 ◽  
Author(s):  
Masashi Nishiki ◽  
Tsuguo Yamaoka ◽  
Ken'ichi Koseki ◽  
Mitsunobu Koshiba
Keyword(s):  
Uv Lithography ◽  
Deep Uv ◽  
Positive Resist

Development of a chemically amplified positive resist material for single-layer deep-UV lithography

1990 ◽  
Author(s):  
Omkaram Nalamasu ◽  
May Cheng ◽  
Janet M. Kometani ◽  
Sheila Vaidya ◽  
Elsa Reichmanis ◽  
...  
Keyword(s):  
Single Layer ◽  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Positive Resist

scholarly journals Large plasmonic color metasurfaces fabricated by super resolution deep UV lithography

2021 ◽  
Vol 3 (8) ◽  
pp. 2236-2244
Author(s):  
Matthias Keil ◽  
Alexandre Emmanuel Wetzel ◽  
Kaiyu Wu ◽  
Elena Khomtchenko ◽  
Jitka Urbankova ◽  
...  
Keyword(s):  
Super Resolution ◽  
Large Area ◽  
Uv Lithography ◽  
Deep Uv

A novel super resolution deep UV lithography method is employed to fabricate large area plasmonic metasurfaces.

scholarly journals 193-nm deep-UV lithography system using a line-narrowed ArF excimer laser

1993 ◽  
Author(s):  
Bruce W. Smith ◽  
Malcolm C. Gower ◽  
Mark Westcott ◽  
Lynn F. Fuller
Keyword(s):  
Excimer Laser ◽  
Uv Lithography ◽  
Arf Excimer Laser ◽  
Deep Uv ◽  
193 Nm ◽  
Lithography System

scholarly journals Dual-band fiber-chip grating coupler in a 300 mm silicon-on-insulator platform and 193-nm deep-UV lithography

2020 ◽  
Author(s):  
David Gonzalez-Andrade ◽  
Diego Pérez Galacho ◽  
Miguel Montesinos Ballester ◽  
Xavier LE ROUX ◽  
Eric Cassan ◽  
...  
Keyword(s):  
Silicon On Insulator ◽  
Dual Band ◽  
Grating Coupler ◽  
Uv Lithography ◽  
Deep Uv ◽  
193 Nm

Fabrication of AlGaN/GaN HEMTs with slant field plates by using deep-UV lithography

2012 ◽  
Author(s):  
Ting-En Hsieh ◽  
Lu-Che Huang ◽  
Yueh-Chin Lin ◽  
Chia-Hua Chang ◽  
Huan-Chung Wang ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Gan Hemts ◽  
Deep Uv

Evaluation of aliphatic 2-diazoketones as photoactive compounds for deep-UV lithography

1990 ◽  
Author(s):  
George Schwartzkopf ◽  
Kathleen B. Gabriel ◽  
John B. Covington
Keyword(s):  
Uv Lithography ◽  
Deep Uv
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