Laser light scattering studies of bulk polymers in the glass transition regime

1981 ◽  
Vol 21 (14) ◽  
pp. 965-969 ◽  
Author(s):  
A. M. Jamieson ◽  
R. Simha ◽  
H. Lee ◽  
J. Tribone
1981 ◽  
Vol 371 (1 Structure and) ◽  
pp. 186-198 ◽  
Author(s):  
A. M. Jamieson ◽  
R. Simha ◽  
H. Lee ◽  
J. Tribone

1993 ◽  
Vol 324 ◽  
Author(s):  
C. Pickering ◽  
D.A.O. Hope ◽  
W.Y. Leong ◽  
D.J. Robbins ◽  
R. Greef

AbstractIn-situ dual-wavelength ellipsometry and laser light scattering have been used to monitor growth of Si/Si1−x,Gex heterojunction bipolar transistor and multi-quantum well (MQW) structures. The growth rate of B-doped Si0 8Ge0.2 has been shown to be linear, but that of As-doped Si is non-linear, decreasing with time. Refractive index data have been obtained at the growth temperature for x = 0.15, 0.20, 0.25. Interface regions ∼ 6-20Å thickness have been detected at hetero-interfaces and during interrupted alloy growth. Period-to-period repeatability of MQW structures has been shown to be ±lML.


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