scholarly journals Theoretical and experimental investigations of surface-waves plasma column and microwave plasma source for applications in reconfigurable plasma antenna

2017 ◽  
Vol 59 (4) ◽  
pp. 806-811 ◽  
Author(s):  
Mohammad Mahdi Abbasi ◽  
Shahrooz Asadi
1982 ◽  
Vol 24 (11) ◽  
pp. 1331-1400 ◽  
Author(s):  
M Moisan ◽  
A Shivarova ◽  
A W Trivelpiece

Vacuum ◽  
2004 ◽  
Vol 76 (2-3) ◽  
pp. 343-346 ◽  
Author(s):  
C.M. Ferreira ◽  
E. Tatarova ◽  
J. Henriques ◽  
F.M. Dias

2000 ◽  
Vol 18 (3) ◽  
pp. 840-848 ◽  
Author(s):  
Mutumi Tuda ◽  
Kouichi Ono ◽  
Hiroki Ootera ◽  
Masaaki Tsuchihashi ◽  
Minoru Hanazaki ◽  
...  

1986 ◽  
Vol 57 (2) ◽  
pp. 164-166 ◽  
Author(s):  
L. G. Meiners ◽  
D. B. Alford

2021 ◽  
Vol 11 (12) ◽  
pp. 5358
Author(s):  
Ju-Hong Cha ◽  
Sang-Woo Kim ◽  
Ho-Jun Lee

For a conventional linear microwave plasma source (LMPS) with a quasi-coaxial line transverse electromagnetic (TEM) waveguide, a linearly extended plasma is sustained by the surface wave outside the tube. Due to the characteristics of the quasi-coaxial line MPS, it is easy to generate a uniform plasma with radially omnidirectional surfaces, but it is difficult to maximize the electron density in a curved selected region. For the purpose of concentrating the plasma density in the deposition area, a novel LMPS which is suitable for curved structure deposition has been developed and compared with the conventional LMPS. As the shape of a circular waveguide, it is filled with relatively high-permittivity dielectric instead of a quasi-coaxial line waveguide. Microwave power at 2.45 GHz is transferred to the plasma through the continuous cylindrical-slotted line antenna, and the radiated electric field in the radial direction is made almost parallel to the tangential plane of the window surface. This research includes the advanced 3D numerical analysis and compares the results with the experiment. It shows that the electron density in the deposition area is higher than that of the conventional quasi-coaxial line plasma MPS.


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