Finite element analysis of the indentation stress characteristics of the thin film/substrate systems by flat cylindrical indenters

2006 ◽  
Vol 37 (8) ◽  
pp. 681-686 ◽  
Author(s):  
BX Xu ◽  
B Zhao ◽  
ZF Yue
Coatings ◽  
2019 ◽  
Vol 9 (2) ◽  
pp. 87 ◽  
Author(s):  
Weidong Liu ◽  
Liangchi Zhang ◽  
Alireza Moridi

The 3ω method is an attractive technique for measuring the thermal conductivity of materials; but it cannot characterise high thermal conductivity ultra-thin film/substrate systems because of the deep heat penetration depth. Recently, a modified 3ω method with a nano-strip was specifically developed for high thermal conductivity thin film systems. This paper aims to evaluate the applicability of this method with the aid of the finite element analysis. To this end, a numerical platform of the modified 3ω method was established and applied to a bulk silicon and an AlN thin-film/Si substrate system. The numerical results were compared with the predictions of theoretical models used in the 3ω method. The study thus concluded that the modified 3ω method is suitable for characterising high thermal conductivity ultra-thin film/substrate systems.


2006 ◽  
Vol 306-308 ◽  
pp. 1151-1156 ◽  
Author(s):  
Chong Du Cho ◽  
Heung Shik Lee ◽  
Chang Boo Kim ◽  
Hyeon Gyu Beom

In this paper, a finite element code especially for micro-magnetostrictive actuators was developed. Two significant characteristics of the presented finite element code are: (1) the magnetostrictive hysteresis phenomenon is effectively taken into account; (2) intrinsic geometric feature of typical thin film structures of large length to thickness ratio, which makes it very difficult to construct finite element mesh in the region of the thin film, is considered reasonably in modeling micro-magneostrictive actuators. For verification purpose, magnetostrictive thin films were fabricated and tested in the form of a cantilevered actuator. The Tb-Fe film and Sm-Fe film are sputtered on the Si and Polyimide substrates individually. The magnetic and magnetostrictive properties of the sputtered magnetostrictive films are measured. The measured magnetostrictive coefficients are compared with the numerically calculated ones.


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