The Effect of Auxiliary Gas Solubilities in Scales upon Parabolic Oxidation Kinetics

1970 ◽  
Vol 21 (11) ◽  
pp. 973-977 ◽  
Author(s):  
G. Simkovich
2006 ◽  
Vol 522-523 ◽  
pp. 77-86 ◽  
Author(s):  
Rex Y. Chen ◽  
W.Y.Daniel Yuen

The oxidation behaviour of a commercial low carbon, low silicon steel in flowing air at 600-920°C was investigated. Parabolic oxidation kinetics was observed at all temperatures. Three oxidation kinetics zones with different oxidation activation energies were identified. The mechanisms responsible for the different oxidation kinetics are discussed.


1965 ◽  
Vol 13 (2) ◽  
pp. 55-60 ◽  
Author(s):  
C.J Rosa ◽  
W.W Smeltzer

1966 ◽  
Vol 113 (12) ◽  
pp. 1255 ◽  
Author(s):  
J. S. Sheasby ◽  
G. R. Wallwork ◽  
W. W. Smeltzer

1989 ◽  
Vol 4 (6) ◽  
pp. 1421-1426 ◽  
Author(s):  
R. A. Konetzki ◽  
Y. A. Chang ◽  
V. C. Marcotte

The solid state oxidation kinetics of Pb–Sn single-phase (2.5 at. % Sn) and eutectic alloys were studied with Auger Electron Spectroscopy combined with sputter depth profiling. The single-phase samples were oxidized in air in the temperature range 22 °C to 250 °C, while the eutectic samples were oxidized from 22 °C to 175 °C. Both alloys oxidize logarithmically between 22 °C and 90 °C and parabolically at temperatures greater than 120 °C. The activation energies for the parabolic oxidation of the single-phase and eutectic alloys are 69.5 and 67.1 ± 8 kJ/mole, respectively.


Materials ◽  
2020 ◽  
Vol 13 (7) ◽  
pp. 1778 ◽  
Author(s):  
Jiang Zhao ◽  
Claire Utton ◽  
Panos Tsakiropoulos

In this paper two Nb-silicide-based alloys with nominal compositions (at.%) Nb-12Ti-18Si-6Ta-2.5W-1Hf-2Sn-2Ge (JZ1) and Nb-12Ti-18Si-6Ta-2.5W-1Hf-5Sn-5Ge (JZ2) were studied. The alloys were designed using the alloy design methodology NICE to meet specific research objectives. The cast microstructures of both alloys were sensitive to solidification conditions. There was macro-segregation of Si in JZ1 and JZ2. In both alloys the βNb5Si3 was the primary phase and the Nbss was stable. The A15-Nb3X (X = Ge,Si,Sn) was stable only in JZ2. The Nbss+βNb5Si3 eutectic in both alloys was not stable as was the Nb3Si silicide that formed only in JZ1. At 800 °C both alloys followed linear oxidation kinetics and were vulnerable to pesting. At 1200 °C both alloys exhibited parabolic oxidation kinetics in the early stages and linear kinetics at longer times. The adhesion of the scale that formed on JZ2 at 1200 °C and consisted of Nb and Ti-rich oxides, silica and HfO2 was better than that of JZ1. The microstructure of JZ2 was contaminated by oxygen to a depth of about 200 μm. There was no Ge or Sn present in the scale. The substrate below the scale was richer in Ge and Sn where the NbGe2, Nb5(Si1-xGex)3, W-rich Nb5(Si1-xGex)3, and A15-Nb3X compounds (X = Ge,Si,Sn) were formed in JZ2. The better oxidation behavior of JZ2 compared with JZ1 correlated well with the decrease in VEC and increase in δ parameter values, in agreement with NICE. For both alloys the experimental data for Si macrosegregation, vol.% Nbss, chemical composition of Nbss and Nb5Si3, and weight gains at 800 and 1200 °C was compared with the calculations (predictions) of NICE. The agreement was very good. The calculated creep rates of both alloys at 1200 °C and 170 MPa were lower than that of the Ni-based superalloy CMSX-4 for the same conditions but higher than 10−7 s−1.


1969 ◽  
Vol 17 (5) ◽  
pp. 579-584 ◽  
Author(s):  
A Madeyski ◽  
D.J Poulton ◽  
W.W Smeltzer

1995 ◽  
Vol 410 ◽  
Author(s):  
Gerald T. Kraus ◽  
Cory S. Oldweiler ◽  
Emmanuel P. Giannelis

ABSTRACTTantalum nitride thin films were produced by nitridation of sol-gel tantala thin films. The oxidation kinetics and the activation energy for oxidation were investigated and compared to those of sputtered tantalum nitride thin films. Data was gathered from in situ sheet resistance measurements taken between 550 and 720 K. Sol-gel films exhibited parabolic oxidation kinetics and had an activation energy of 1.9 eV. Sputtered films displayed quartic oxidation kinetics at lower temperatures tending toward cubic kinetics at higher temperatures and had an activation energy of 1.6 eV.


1993 ◽  
Vol 12 (3) ◽  
pp. 177-184 ◽  
Author(s):  
Jeanette Persson ◽  
Per-Olov Käll ◽  
Mats Nygren

1964 ◽  
Vol 12 (4) ◽  
pp. 409-415 ◽  
Author(s):  
G.R Wallwork ◽  
W.W Smeltzer ◽  
C.J Rosa

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