The Parabolic Oxidation Kinetics of Niobium

1966 ◽  
Vol 113 (12) ◽  
pp. 1255 ◽  
Author(s):  
J. S. Sheasby ◽  
G. R. Wallwork ◽  
W. W. Smeltzer
Keyword(s):  
Oxidation Kinetics ◽  
Parabolic Oxidation ◽  
Kinetics Of

The parabolic oxidation kinetics of beta-zirconium

1965 ◽  
Vol 13 (2) ◽  
pp. 55-60 ◽  
Author(s):  
C.J Rosa ◽  
W.W Smeltzer
Keyword(s):  
Oxidation Kinetics ◽  
Parabolic Oxidation ◽  
Kinetics Of

Oxidation kinetics of Pb–Sn alloys

1989 ◽  
Vol 4 (6) ◽  
pp. 1421-1426 ◽  
Author(s):  
R. A. Konetzki ◽  
Y. A. Chang ◽  
V. C. Marcotte
Keyword(s):  
Solid State ◽  
Auger Electron Spectroscopy ◽  
Oxidation Kinetics ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Single Phase ◽  
Depth Profiling ◽  
Eutectic Alloys ◽  
Parabolic Oxidation ◽  
Kinetics Of

The solid state oxidation kinetics of Pb–Sn single-phase (2.5 at. % Sn) and eutectic alloys were studied with Auger Electron Spectroscopy combined with sputter depth profiling. The single-phase samples were oxidized in air in the temperature range 22 °C to 250 °C, while the eutectic samples were oxidized from 22 °C to 175 °C. Both alloys oxidize logarithmically between 22 °C and 90 °C and parabolically at temperatures greater than 120 °C. The activation energies for the parabolic oxidation of the single-phase and eutectic alloys are 69.5 and 67.1 ± 8 kJ/mole, respectively.

Parabolic oxidation kinetics of alpha-zirconium

1969 ◽  
Vol 17 (5) ◽  
pp. 579-584 ◽  
Author(s):  
A Madeyski ◽  
D.J Poulton ◽  
W.W Smeltzer
Keyword(s):  
Oxidation Kinetics ◽  
Parabolic Oxidation ◽  
Kinetics Of

Synthesis and Oxidation Kinetics of Sol-Gel and Sputtered Tantalum Nitride Thin Films

1995 ◽  
Vol 410 ◽  
Author(s):  
Gerald T. Kraus ◽  
Cory S. Oldweiler ◽  
Emmanuel P. Giannelis
Keyword(s):  
Thin Films ◽  
Activation Energy ◽  
Oxidation Kinetics ◽  
Sol Gel ◽  
Tantalum Nitride ◽  
Sputtered Films ◽  
Parabolic Oxidation ◽  
Sol Gel Films ◽  
Kinetics Of

ABSTRACTTantalum nitride thin films were produced by nitridation of sol-gel tantala thin films. The oxidation kinetics and the activation energy for oxidation were investigated and compared to those of sputtered tantalum nitride thin films. Data was gathered from in situ sheet resistance measurements taken between 550 and 720 K. Sol-gel films exhibited parabolic oxidation kinetics and had an activation energy of 1.9 eV. Sputtered films displayed quartic oxidation kinetics at lower temperatures tending toward cubic kinetics at higher temperatures and had an activation energy of 1.6 eV.

Parabolic-non-parabolic oxidation kinetics of Si3N4

1993 ◽  
Vol 12 (3) ◽  
pp. 177-184 ◽  
Author(s):  
Jeanette Persson ◽  
Per-Olov Käll ◽  
Mats Nygren
Keyword(s):  
Oxidation Kinetics ◽  
Parabolic Oxidation ◽  
Kinetics Of

The parabolic oxidation kinetics of alpha-zirconium at 850°C

1964 ◽  
Vol 12 (4) ◽  
pp. 409-415 ◽  
Author(s):  
G.R Wallwork ◽  
W.W Smeltzer ◽  
C.J Rosa
Keyword(s):  
Oxidation Kinetics ◽  
Parabolic Oxidation ◽  
Kinetics Of

Impact Of Synthesis Route on the Water Oxidation Kinetics of Hematite Photoanodes

2020 ◽  
Author(s):  
Camilo A. Mesa ◽  
Ludmilla Steier ◽  
Benjamin Moss ◽  
Laia Francàs ◽  
James E. Thorne ◽  
...  
Keyword(s):  
Oxygen Vacancy ◽  
Reaction Kinetics ◽  
Water Oxidation ◽  
Oxidation Kinetics ◽  
Oxidation Reaction ◽  
Charge Accumulation ◽  
Optical Signals ◽  
Current Voltage ◽  
Voltage Performance ◽  
Kinetics Of

<p><i>Operando</i> spectroelectrochemical analysis is used to determine the water oxidation reaction kinetics for hematite photoanodes prepared using four different synthetic procedures. Whilst these photoanodes exhibit very different current / voltage performance, their underlying water oxidation kinetics are found to be almost invariant. Lower photoanode performance was found to correlate with the observation of optical signals indicative of charge accumulation in mid-gap oxygen vacancy states, indicating these states do not contribute directly to water oxidation.</p>

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