Temperature dependent X‐ray diffraction and Raman spectroscopy studies of polycrystalline YCrO 3 ceramics across the T C ~ 460 K

2019 ◽  
Vol 51 (3) ◽  
pp. 537-545 ◽  
Author(s):  
Ashish Kumar Mall ◽  
Barnita Paul ◽  
Ashish Garg ◽  
Rajeev Gupta
Keyword(s):  
Raman Spectroscopy ◽  
X Ray Diffraction ◽  
Temperature Dependent ◽  
X Ray ◽  
Spectroscopy Studies

ChemInform Abstract: On the Symmetry of Ba3Al2O6- X-Ray Diffraction and Raman Spectroscopy Studies.

ChemInform ◽  
2009 ◽  
Vol 40 (14) ◽  
Author(s):  
B. Lazic ◽  
V. Kahlenberg ◽  
R. Kaindl ◽  
A. Kremenovic
Keyword(s):  
Raman Spectroscopy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Spectroscopy Studies

scholarly journals X-ray diffraction and Raman spectroscopy studies of high-pressure polymorphs ofL- andDL-serine

2006 ◽  
Vol 62 (a1) ◽  
pp. s255-s255
Author(s):  
E. Boldyreva ◽  
T. Drebushchak ◽  
H. Sowa ◽  
S. Goryainov ◽  
V. Chernyshev ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
High Pressure ◽  
X Ray Diffraction ◽  
X Ray ◽  
Spectroscopy Studies

X-ray Diffraction, Dielectric, and Raman Spectroscopy Studies of SrTiO3-Based Microwave Ceramics

2015 ◽  
Vol 45 (1) ◽  
pp. 715-721 ◽  
Author(s):  
Jingjing Qu ◽  
Fei Liu ◽  
Xing Wei ◽  
Changlai Yuan ◽  
Xinyu Liu ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
X Ray Diffraction ◽  
Microwave Ceramics ◽  
X Ray ◽  
Spectroscopy Studies

X-ray diffraction and Raman spectroscopy studies in Na1/2Bi1/2TiO3-SrTiO3-PbTiO3 solid solutions

2016 ◽  
Vol 503 (1) ◽  
pp. 52-59 ◽  
Author(s):  
M. Dunce ◽  
E. Birks ◽  
A. Kuzmin ◽  
R. Ignatans ◽  
A. Plaude ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Solid Solutions ◽  
X Ray Diffraction ◽  
X Ray ◽  
Spectroscopy Studies

scholarly journals A study of nickel and cobalt silicides formed in the Ni/Co/Si(1 0 0) system by thermal annealing

2020 ◽  
Vol 0 (0) ◽  
Author(s):  
C. Sedrati ◽  
A. Bouabellou ◽  
A. Kabir ◽  
R. Haddad ◽  
M. Boudissa ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Sheet Resistance ◽  
Annealing Temperature ◽  
X Ray Diffraction ◽  
Temperature Dependent ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Sheet Resistance Measurement ◽  
Cobalt Silicides

AbstractIn this work, the Ni/Co/Si system was annealed at temperatures ranging from 300 °C to 800 °C. The samples were characterized by means of X-ray diffraction (XRD), Raman spectroscopy, Rutherford backscattering spectroscopy (RBS), atomic force microscopy (AFM) and sheet resistance measurement. The XRD and Raman spectroscopy results showed that the formation of nickel and cobalt silicides (CoSi, Co2Si, Ni2Si, NiSi, NiSi2, CoSi2) is an annealing temperature dependent diffusion process. The diffusion phenomenon was evidenced by RBS. The low values of the sheet resistance which were correlated with the films surface roughness were attributed to the formation of both CoSi and NiSi phases.

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