Giant magnetoresistance and magnetic anisotropy of Co9Fe/Cu/Co9Fe multilayer thin films on an MgO(110) substrate

1995 ◽  
Vol 115 (6) ◽  
pp. 1-7
Author(s):  
Koichiro Inomata ◽  
Yoshiaki Saito
2008 ◽  
Vol 103 (2) ◽  
pp. 023920 ◽  
Author(s):  
Darren Smith ◽  
Vishal Parekh ◽  
Chunsheng E ◽  
Shishan Zhang ◽  
Wolfgang Donner ◽  
...  

1993 ◽  
Vol 126 (1-3) ◽  
pp. 516-518 ◽  
Author(s):  
P.J. Grundy ◽  
R.J. Pollard ◽  
M.E. Tomlinson

1994 ◽  
Vol 343 ◽  
Author(s):  
W. Y. Lee ◽  
G. Gorman ◽  
R. Savoy

ABSTRACTGiant magnetoresistance with low saturation fields (Hs’s) is reported in Au and permalloy (Ni0.82Fe0.18) or Co-doped permalloy multilayer thin films as-deposited on Ta-overcoated Si and glass substrates. A ΔR/R as high as 4.0% with ≈25 Oe Hs was observed at 295 K for the film consisting of 10 layers of 24 Å Au/13 Å Ni0.82Fe0.18 deposited on a 3 Å Ta-overcoated glass at 50 °C. A Hs value as low as ≈20 Oe with a 15% smaller ΔR/R has been observed for the films with a thicker (e.g., 50 Å) Ta underlayer. Magnetic hysteresis loops of these films indicate the presence of antiferromagnetic exchange coupling between the Ni0.82Fe0.18 layers. This exchange coupling is much smaller for the multilayer films without the Ta underlayer, resulting in a 6x smaller ΔR/R and lOx larger Hs observed for these films. Results of x-ray diffraction analysis indicate stronger (111) texturing for the multilayer films with a Ta underlayer, consistent with the stronger antiferromagnetic coupling between the the Ni0.82Fe0.18 layers in the film. The addition of 2–10 % Co moderately increases the ΔR/R value, but also increases substantially the Hs (up to ≈200 Oe).


2012 ◽  
Vol 476-478 ◽  
pp. 2335-2338 ◽  
Author(s):  
Yuan Wang ◽  
Hao Geng ◽  
Shuang Jun Nie ◽  
Jian Qing Wei ◽  
Lai Sen Wang ◽  
...  

A series of [Fe80Ni20-O/ZnO]nmultilayer thin films with different ZnO separate layer thicknesses (t, from 0 to 3 nm) and fixed Fe80Ni20-O layer thickness (about 5 nm) have been fabricated on (100)-oriented silicon wafers and glass substrates by reactive magnetron sputtering. Microstructure analysis and static magnetic measurement results indicate that the magnetic properties of the films can be adjusted by the variation of ZnO monolayers thickness. All films reveal an evident in-plane uniaxial magnetic anisotropy (IPUMA). The values of in-plane uniaxial magnetic anisotropy fields (Hk) and resistivity (ρ) can be changed from 8 to 57 Oe and 62 to 168 μΩ•cm respectively with the t increasing. While the values of hard axis coercivity (Hch) and easy axis coercivity (Hce) reveal minimums of 1.5 and 3 Oe respectively at t = 1 nm.


Science ◽  
1993 ◽  
Vol 261 (5124) ◽  
pp. 1021-1024 ◽  
Author(s):  
T. L. Hylton ◽  
K. R. Coffey ◽  
M. A. Parker ◽  
J. K. Howard

2021 ◽  
Vol 728 ◽  
pp. 138689
Author(s):  
B. Brahma ◽  
R. Hussain ◽  
Aakansha ◽  
Pratap Behera ◽  
S. Ravi ◽  
...  

1996 ◽  
Vol 32 (2) ◽  
pp. 590-598 ◽  
Author(s):  
J.O. Oti ◽  
S.E. Russek ◽  
S.C. Sanders ◽  
R.W. Cross

1994 ◽  
Vol 356 ◽  
Author(s):  
J.D. Jarratt ◽  
J.A. Barnard

AbstractThin film stress has been measured in (Ni66Fe16Co18 25 Å/Ag 50 Å) multilayer thin films that exhibit annealing-induced giant magnetoresistance (GMR) known as ‘discontinuous’ GMR1. This GMR results when NiFeCo layers are broken up into discontinuous ferromagnetic islands or platelets by immiscible Ag atom grain boundary diffusion normal to the film plane. As-deposited films display no GMR and are in compression. An MR value of 5 % with a relatively sharp profile can be induced in a ten bilayer sample annealed at 400°C for 15 min. Annealing generally results in a decrease in the as-deposited compressive stress and can result in tensile stress at high enough temperatures. Interestingly, at the annealing temperatures corresponding to the maximum induced GMR, there is a plateau in the otherwise monotonic decrease in compressive stress with increasing temperature.Stress-temperature plots reveal a plateau in the stress value during the heating of a ten bilayer sample due to plastic deformation in the film via densification. Isothermal stress-time plots done on a single sample show increasing compressive stress relief after each successively higher temperature anneal. The stress was also measured in a single bilayer film with the same volume of film as in a ten bilayer sample but far fewer interfaces. High and low angle x-ray diffraction (HXRD, LXRD) was used to reveal the structural evolution with annealing. Magnetic (M-H) hysteresis measurements revealed increasing coercivity and decreasing induced as-deposited in-plane magnetic uniaxial anisotropy with annealing temperature.


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