Photocatalytic Properties of WO3/TiO2Core/Shell Nanofibers prepared by Electrospinning and Atomic Layer Deposition

2013 ◽  
Vol 19 (4-6) ◽  
pp. 149-155 ◽  
Author(s):  
Imre Miklós Szilágyi ◽  
Eero Santala ◽  
Mikko Heikkilä ◽  
Viljami Pore ◽  
Marianna Kemell ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Photocatalytic Properties ◽  
Layer Deposition

Direct formation of anatase TiO2nanoparticles on carbon nanotubes by atomic layer deposition and their photocatalytic properties

2016 ◽  
Vol 27 (40) ◽  
pp. 405702 ◽  
Author(s):  
Sheng-Hsin Huang ◽  
Shih-Yun Liao ◽  
Chih-Chieh Wang ◽  
Chi-Chung Kei ◽  
Jon-Yiew Gan ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Photocatalytic Properties ◽  
Layer Deposition ◽  
Direct Formation

CNT/TiO2 core-shell structures prepared by atomic layer deposition and characterization of their photocatalytic properties

2016 ◽  
Vol 616 ◽  
pp. 151-159 ◽  
Author(s):  
Sheng-Hsin Huang ◽  
Chih-Chieh Wang ◽  
Shih-Yun Liao ◽  
Jon-Yiew Gan ◽  
Tsong-Pyng Perng
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Shell Structures ◽  
Photocatalytic Properties ◽  
Core Shell ◽  
Layer Deposition

Improvement of the photocatalytic degradation property of atomic layer deposited ZnO thin films: the interplay between film properties and functional performances

2015 ◽  
Vol 3 (21) ◽  
pp. 11453-11461 ◽  
Author(s):  
V. Rogé ◽  
N. Bahlawane ◽  
G. Lamblin ◽  
I. Fechete ◽  
F. Garin ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Photocatalytic Degradation ◽  
Atomic Layer ◽  
Photocatalytic Properties ◽  
Zno Thin Films ◽  
Film Properties ◽  
Layer Deposition ◽  
The Impact

In this work, we have evidenced the impact of stoichiometry on the photocatalytic properties of ZnO nanofilms grown by atomic layer deposition (ALD).

scholarly journals Photocatalytic properties of TiO2@polymer and TiO2@carbon aerogel composites prepared by atomic layer deposition

Carbon ◽  
2019 ◽  
Vol 147 ◽  
pp. 476-482 ◽  
Author(s):  
Nóra Justh ◽  
Gergő János Mikula ◽  
László Péter Bakos ◽  
Balázs Nagy ◽  
Krisztina László ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Carbon Aerogel ◽  
Photocatalytic Properties ◽  
Layer Deposition

Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

2021 ◽  
Vol 3 (1) ◽  
pp. 59-71
Author(s):  
Degao Wang ◽  
Qing Huang ◽  
Weiqun Shi ◽  
Wei You ◽  
Thomas J. Meyer
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dye Sensitized ◽  
Layer Deposition

Workfunction of Al-Doped ZnO Films Deposited by Atomic Layer Deposition

2018 ◽  
Author(s):  
Peter George Gordon ◽  
Goran Bacic ◽  
Gregory P. Lopinski ◽  
Sean Thomas Barry
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Ratio ◽  
Aluminum Concentration ◽  
Zno Films ◽  
Transparent Conductor ◽  
Kelvin Probe ◽  
Layer Deposition ◽  
Earth Abundant ◽  
Doped Zno

Al-doped ZnO (AZO) is a promising earth-abundant alternative to Sn-doped In<sub>2</sub>O<sub>3</sub> (ITO) as an n-type transparent conductor for electronic and photovoltaic devices; AZO is also more straightforward to deposit by atomic layer deposition (ALD). The workfunction of this material is particularly important for the design of optoelectronic devices. We have deposited AZO films with resistivities as low as 1.1 x 10<sup>-3</sup> Ωcm by ALD using the industry-standard precursors trimethylaluminum (TMA), diethylzinc (DEZ), and water at 200<sup>◦</sup>C. These films were transparent and their elemental compositions showed reasonable agreement with the pulse program ratios. The workfunction of these films was measured using a scanning Kelvin Probe (sKP) to investigate the role of aluminum concentration. In addition, the workfunction of AZO films prepared by two different ALD recipes were compared: a “surface” recipe wherein the TMA was pulsed at the top of each repeating AZO stack, and a interlamellar recipe where the TMA pulse was introduced halfway through the stack. As aluminum doping increases, the surface recipe produces films with a consistently higher workfunction as compared to the interlamellar recipe. The resistivity of the surface recipe films show a minimum at a 1:16 Al:Zn atomic ratio and using an interlamellar recipe, minimum resistivity was seen at 1:19. The film thicknesses were characterized by ellipsometry, chemical composition by EDX, and resistivity by four-point probe.<br>

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