In Situ Reflective High-Energy Electron Diffraction Analysis During the Initial Stage of a Trimethylaluminum/Water ALD Process

R. Bankras; J. Holleman; J. Schmitz; M. Sturm; A. Zinine; H. Wormeester; B. Poelsema

doi:10.1002/cvde.200506433

In Situ Reflective High-Energy Electron Diffraction Analysis During the Initial Stage of a Trimethylaluminum/Water ALD Process

Chemical Vapor Deposition ◽

10.1002/cvde.200506433 ◽

2006 ◽

Vol 12 (5) ◽

pp. 275-279 ◽

Cited By ~ 9

Author(s):

R. Bankras ◽

J. Holleman ◽

J. Schmitz ◽

M. Sturm ◽

A. Zinine ◽

...

Keyword(s):

Electron Diffraction ◽

Diffraction Analysis ◽

High Energy ◽

Energy Electron ◽

Electron Diffraction Analysis ◽

High Energy Electron ◽

Initial Stage

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Reflection high-energy electron diffraction analysis of the InSb{111}A,B-(2 × 2) surfaces

Surface Science ◽

10.1016/s0039-6028(97)00693-6 ◽

1998 ◽

Vol 396 (1-3) ◽

pp. 394-399 ◽

Cited By ~ 15

Author(s):

Akihiro Ohtake ◽

Jun Nakamura

Keyword(s):

Electron Diffraction ◽

Diffraction Analysis ◽

High Energy ◽

Energy Electron ◽

Electron Diffraction Analysis ◽

High Energy Electron

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Reflection high-energy electron-diffraction analysis of the Si(111)-(7×7) reconstruction

Physical Review B ◽

10.1103/physrevb.49.17448 ◽

1994 ◽

Vol 49 (24) ◽

pp. 17448-17451 ◽

Cited By ~ 9

Author(s):

Y. Ma ◽

S. Lordi ◽

J. A. Eades ◽

S. Ino

Keyword(s):

Electron Diffraction ◽

Diffraction Analysis ◽

High Energy ◽

Energy Electron ◽

Electron Diffraction Analysis ◽

High Energy Electron

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Time-resolved reflection high energy electron diffraction analysis for atomic layer depositions of GaSb by molecular beam epitaxy

Journal of Crystal Growth ◽

10.1016/0022-0248(94)00509-5 ◽

1995 ◽

Vol 146 (1-4) ◽

pp. 349-353

Author(s):

Mitsuaki Yano ◽

Kazuhiko Yamamoto ◽

Takashige Utatsu ◽

Masataka Inoue

Keyword(s):

Molecular Beam Epitaxy ◽

Electron Diffraction ◽

Diffraction Analysis ◽

Molecular Beam ◽

Atomic Layer ◽

High Energy ◽

Energy Electron ◽

Electron Diffraction Analysis ◽

High Energy Electron ◽

Time Resolved

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Reflection High-Energy Electron Diffraction Analysis of InN Grown on Si (111) with Molecular Beam Epitaxy

Journal of the Korean Physical Society ◽

10.3938/jkps.53.1456 ◽

2008 ◽

Vol 53 (3) ◽

pp. 1456-1459

Author(s):

S. R. Park ◽

J. W. Lee ◽

M. D. Kim ◽

J. E. Oh ◽

S. G. Kim ◽

...

Keyword(s):

Molecular Beam Epitaxy ◽

Electron Diffraction ◽

Diffraction Analysis ◽

Molecular Beam ◽

High Energy ◽

Energy Electron ◽

Electron Diffraction Analysis ◽

High Energy Electron

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Reflection high-energy electron diffraction analysis of polycrystalline films with grain size and orientation distributions

Journal of Applied Physics ◽

10.1063/1.1510954 ◽

2002 ◽

Vol 92 (9) ◽

pp. 5133-5139 ◽

Cited By ~ 6

Author(s):

J. W. Hartman ◽

R. T. Brewer ◽

Harry A. Atwater

Keyword(s):

Grain Size ◽

Electron Diffraction ◽

Diffraction Analysis ◽

High Energy ◽

Energy Electron ◽

Electron Diffraction Analysis ◽

High Energy Electron ◽

Polycrystalline Films ◽

Orientation Distributions ◽

Grain Size And Orientation

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Time-Resolved Reflection High-Energy Electron Diffraction Analysis in Initial Stage of 3C-SiC Growth on Si(001) by Gas Source Molecular Beam Epitaxy

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.5255 ◽

1996 ◽

Vol 35 (Part 1, No. 10) ◽

pp. 5255-5260 ◽

Cited By ~ 24

Author(s):

Tomoaki Hatayama ◽

Takashi Fuyuki ◽

Hiroyuki Matsunami

Keyword(s):

Molecular Beam Epitaxy ◽

Electron Diffraction ◽

Diffraction Analysis ◽

Molecular Beam ◽

High Energy ◽

Electron Diffraction Analysis ◽

High Energy Electron ◽

Time Resolved ◽

Gas Source ◽

Initial Stage

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A reflection high energy electron diffraction analysis of the orientation of the monoclinic subcell of 22-tricosenoic acid langmuir-blodgett bilayers as a function of the deposition pressure

Thin Solid Films ◽

10.1016/0040-6090(89)90126-0 ◽

1989 ◽

Vol 172 (1) ◽

pp. 149-158 ◽

Cited By ~ 13

Author(s):

I. Robinson ◽

J.R. Sambles ◽

I.R. Peterson

Keyword(s):

Electron Diffraction ◽

Diffraction Analysis ◽

High Energy ◽

Energy Electron ◽

Electron Diffraction Analysis ◽

High Energy Electron ◽

Deposition Pressure ◽

Langmuir Blodgett

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Reflection high‐energy electron diffraction analysis of iron silicide growth on Si(110)

Journal of Applied Physics ◽

10.1063/1.362760 ◽

1996 ◽

Vol 80 (1) ◽

pp. 559-564 ◽

Cited By ~ 5

Author(s):

Jie Wu ◽

Saburo Shimizu

Keyword(s):

Electron Diffraction ◽

Diffraction Analysis ◽

Iron Silicide ◽

High Energy ◽

Energy Electron ◽

Electron Diffraction Analysis ◽

High Energy Electron ◽

Silicide Growth

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Real time measurements of surface growth evolution in magnetron sputtered single crystal Mo/V superlattices using in situ reflection high energy electron diffraction analysis

Surface Science ◽

10.1016/s0039-6028(99)00498-7 ◽

1999 ◽

Vol 431 (1-3) ◽

pp. 16-25 ◽

Cited By ~ 8

Author(s):

E.B. Svedberg ◽

J. Birch ◽

C.N.L. Edvardsson ◽

J.-E. Sundgren

Keyword(s):

Electron Diffraction ◽

Single Crystal ◽

Diffraction Analysis ◽

Real Time ◽

High Energy ◽

Surface Growth ◽

Electron Diffraction Analysis ◽

High Energy Electron ◽

Growth Evolution

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Lattice relaxation and three‐dimensional reflection high‐energy electron‐diffraction analysis of strained epitaxial Co/Mn superlattices

Journal of Applied Physics ◽

10.1063/1.357516 ◽

1994 ◽

Vol 76 (5) ◽

pp. 2817-2824 ◽

Cited By ~ 14

Author(s):

Y. Henry ◽

V. Pierron‐Bohnes ◽

P. Vennégues ◽

K. Ounadjela

Keyword(s):

Electron Diffraction ◽

Diffraction Analysis ◽

Three Dimensional ◽

Lattice Relaxation ◽

High Energy ◽

Energy Electron ◽

Electron Diffraction Analysis ◽

High Energy Electron

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