Crosstalk noise analysis in ternary logic multilayer graphene nanoribbon interconnects using shielding techniques

2020 ◽  
Vol 48 (12) ◽  
pp. 2041-2055
Author(s):  
Tulasi Naga Jyothi Kolanti ◽  
Vasundhara Patel Kerehalli Shankar Rao
Keyword(s):  
Noise Analysis ◽  
Graphene Nanoribbon ◽  
Multilayer Graphene ◽  
Ternary Logic ◽  
Crosstalk Noise

scholarly journals The Ultra-Low-k Dielectric Materials for Performance Improvement in Coupled Multilayer Graphene Nanoribbon Interconnects

Electronics ◽  
2019 ◽  
Vol 8 (8) ◽  
pp. 849 ◽  
Author(s):  
Peng Xu ◽  
Zhongliang Pan ◽  
Zhenhua Tang
Keyword(s):  
Delay Time ◽  
Dielectric Material ◽  
Dielectric Materials ◽  
Dielectric Medium ◽  
Graphene Nanoribbon ◽  
Noise Voltage ◽  
Multilayer Graphene ◽  
Crosstalk Noise ◽  
Characteristic Analysis ◽  
Low K

The ultra-low-k dielectric material replacing the conventional SiO2 dielectric medium in coupled multilayer graphene nanoribbon (MLGNR) interconnects is presented. An equivalent distributed transmission line model of coupled MLGNR interconnects is established to derive the analytical expressions of crosstalk delay, transfer gain, and noise output for 7.5 nm technology node at global level, which take the in-phase and out-of-phase crosstalk into account. The results show that by replacing the SiO2 dielectric mediums with the nanoglass, the maximum reduction of delay time and peak noise voltage are 25.202 ns and 0.102 V for an interconnect length of 3000 µm, respectively. It is demonstrated that the ultra-low-k dielectric materials can significantly reduce delay time and crosstalk noise and increase transfer gain compared with the conventional SiO2 dielectric medium. Moreover, it is found that the coupled MLGNR interconnect under out-of-phase mode has a larger crosstalk delay and a lesser transfer gain than that under in-phase mode, and the peak noise voltage increases with the increase of the coupled MLGNR interconnect length. The results presented in this paper would be useful to aid in the enhancement of performance of on-chip interconnects and provide guidelines for signal characteristic analysis of MLGNR interconnects.

Analysis of Crosstalk-Induced Effects in Multilayer Graphene Nanoribbon Interconnects

2017 ◽  
Vol 26 (06) ◽  
pp. 1750102 ◽  
Author(s):  
Manodipan Sahoo ◽  
Hafizur Rahaman
Keyword(s):  
Integrated Circuits ◽  
Integrated Circuit ◽  
Future Generation ◽  
Graphene Nanoribbon ◽  
Copper Interconnects ◽  
Multilayer Graphene ◽  
Crosstalk Noise ◽  
Worst Case ◽  
Suitable Alternative ◽  
The Future

Crosstalk effects in multilayer graphene nanoribbon (GNR) interconnects for the future nanoscale integrated circuits are investigated with the help of ABCD parameter matrix approach for intermediate- and global-level interconnects at 11[Formula: see text]nm and 8[Formula: see text]nm technology nodes. The worst-case crosstalk-induced delay and peak crosstalk noise voltages are derived for both neutral and doped zigzag GNR interconnects and compared to those of conventional copper interconnects. The worst-case crosstalk delays for perfectly specular, doped multilayer GNR interconnects are less than 4% of that of copper interconnects for 1[Formula: see text]mm long intermediate interconnects and less than 7% of that of copper interconnects for 5[Formula: see text]mm long global interconnects at 8[Formula: see text]nm node. As far as the worst-case peak crosstalk noise voltage is concerned, neutral GNR interconnects are slightly better performing than their doped counterparts. But from the perspective of overall noise contribution, doped GNR interconnects outperform neutral ones for all the cases. Finally, our analysis shows that from the signal integrity perspective, perfectly specular, doped multilayer zigzag GNR interconnects are a suitable alternative to copper interconnects for the future-generation integrated circuit technology.

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