Preparation of aluminosilicate crystalline coatings from sol-gel derived alumina films deposited on silicon/silica substrates

2005 ◽  
Vol 40 (1-2) ◽  
pp. 114-124 ◽  
Author(s):  
E. Gutmann ◽  
A. A. Levin ◽  
I. Pommrich ◽  
D. C. Meyer
1984 ◽  
Vol 32 ◽  
Author(s):  
Carlo G. Pantano ◽  
C. A. Houser ◽  
R. K. Brow

ABSTRACTThe application of surface analysis techniques to the characterization of sol/gel surfaces and thin films is described. Secondary-ion mass spectroscopy (SIMS), x-ray photoelectron spectroscopy (XPS) and sputter-induced photon spectroscopy (SIPS) are used to measure the composition of multicomponent silicate films, the relative water content of alumina films, the nitrogen content of ammonia treated silica films, and the depth profiles for films on black chrome. The determination of chemical structure using XPS and SIMS is also discussed. Finally, a brief introduction to temperature-programmed desorption (TPD) and its potential for studying surface chemical reactions, in situ, is presented.


1986 ◽  
Vol 21 (3) ◽  
pp. 301-306 ◽  
Author(s):  
R. Brusasco ◽  
R. Kershaw ◽  
J. Baglio ◽  
K. Dwight ◽  
A. Wold

2000 ◽  
Vol 616 ◽  
Author(s):  
G. Grandinetti ◽  
S. Shanmugham ◽  
M.R. Hendrick ◽  
J.M. Hampikian

Abstractα-Alumina films are useful for high-temperature, wear, and semiconductor device applications because of their good oxidation resistance, high hardness values, and electrical properties. α-Alumina films have been previously synthesized using techniques such as chemical vapor deposition, sol-gel, physical vapor deposition, and plasma spraying. This paper presents an alternative approach for producing high quality dense α-alumina coatings using a flame-assisted process called combustion chemical vapor deposition (CCVD). This process is an open atmosphere technique that does not require the use of a reaction chamber. In this work alumina films were grown on YSZ at temperatures ranging from 900 to 1500°C. At lower temperatures only amorphous alumina was grown, but as the deposition temperature increased different alumina phases were formed. At 1100°C, a thin highly crystalline θ-Al2O3 coating was formed. At temperatures higher than 1100°C thick θ-Al2O3 coatings were deposited on the YSZ. Coatings were characterized by scanning electron microscopy (SEM) and x-ray diffraction (XRD).


Author(s):  
J C Villegas Brito ◽  
N V Gaponenko ◽  
K S Sukalin ◽  
T F Raichenok ◽  
S A Tikhomorov ◽  
...  

2017 ◽  
Vol 84 (4) ◽  
pp. 674-678
Author(s):  
J. C. Villegas Brito ◽  
N. V. Gaponenko ◽  
K. S. Sukalin ◽  
T. F. Raichenok ◽  
S. A. Tikhomirov ◽  
...  

2006 ◽  
Vol 201 (6) ◽  
pp. 3653-3657 ◽  
Author(s):  
Naoko Yamaguchi ◽  
Kiyoharu Tadanaga ◽  
Atsunori Matsuda ◽  
Tsutomu Minami ◽  
Masahiro Tatsumisago

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