Combined Secondary Ion Mass Spectrometry Depth Profiling and Focused Ion Beam Analysis of Cu Films Electrodeposited under Oscillatory Conditions

Nguyen T. M. Hai; David Lechner; Florian Stricker; Julien Furrer; Peter Broekmann

doi:10.1002/celc.201402427

Combined Secondary Ion Mass Spectrometry Depth Profiling and Focused Ion Beam Analysis of Cu Films Electrodeposited under Oscillatory Conditions

ChemElectroChem ◽

10.1002/celc.201402427 ◽

2015 ◽

Vol 2 (5) ◽

pp. 664-671 ◽

Cited By ~ 9

Author(s):

Nguyen T. M. Hai ◽

David Lechner ◽

Florian Stricker ◽

Julien Furrer ◽

Peter Broekmann

Keyword(s):

Mass Spectrometry ◽

Focused Ion Beam ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Depth Profiling ◽

Ion Beam Analysis ◽

Cu Films ◽

Beam Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Inside Cover: Combined Secondary Ion Mass Spectrometry Depth Profiling and Focused Ion Beam Analysis of Cu Films Electrodeposited under Oscillatory Conditions (ChemElectroChem 5/2015)

ChemElectroChem ◽

10.1002/celc.201590021 ◽

2015 ◽

Vol 2 (5) ◽

pp. 618-618

Author(s):

Nguyen T. M. Hai ◽

David Lechner ◽

Florian Stricker ◽

Julien Furrer ◽

Peter Broekmann

Keyword(s):

Mass Spectrometry ◽

Focused Ion Beam ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Depth Profiling ◽

Ion Beam Analysis ◽

Cu Films ◽

Beam Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Secondary ion mass spectrometry depth profiling of nanometer-scale p+-n junctions fabricated by Ga+ focused ion beam implantation

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586355 ◽

1992 ◽

Vol 10 (1) ◽

pp. 333 ◽

Cited By ~ 14

Author(s):

Steven W. Novak

Keyword(s):

Mass Spectrometry ◽

Focused Ion Beam ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Depth Profiling ◽

Nanometer Scale ◽

Ion Beam Implantation ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Charge neutralization using secondary electron shower for shave-off depth profiling by focused ion beam secondary ion mass spectrometry

Applied Surface Science ◽

10.1016/j.apsusc.2008.05.103 ◽

2008 ◽

Vol 255 (4) ◽

pp. 1351-1353

Author(s):

Y. Ishizaki ◽

T. Yamamoto ◽

M. Fujii ◽

M. Owari ◽

M. Nojima ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Electron ◽

Focused Ion Beam ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Depth Profiling ◽

Charge Neutralization ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Electron Shower

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Secondary ion mass spectrometry and its relation to high-energy ion beam analysis techniques

Nuclear Instruments and Methods in Physics Research ◽

10.1016/0029-554x(81)91019-3 ◽

1981 ◽

Vol 191 (1-3) ◽

pp. 297-307 ◽

Cited By ~ 27

Author(s):

Charles W. Magee

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

High Energy ◽

Ion Beam Analysis ◽

Analysis Techniques ◽

Beam Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Fundamentals and Present Aspects of Ion Beam Technology. IV. Ion Beam Analysis. 3. Secondary ion mass spectrometry.

RADIOISOTOPES ◽

10.3769/radioisotopes.44.284 ◽

1995 ◽

Vol 44 (4) ◽

pp. 284-294 ◽

Cited By ~ 1

Author(s):

Masao MASHITA

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Ion Beam Analysis ◽

Beam Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Comparison of the Spectra of LiCoO2, CoO, and Co3O4 by Time-of-Flight Secondary Ion Mass Spectrometry with Focused Ion Beam (FIB-TOF-SIMS)

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.56.122 ◽

2013 ◽

Vol 56 (4) ◽

pp. 122-124 ◽

Cited By ~ 2

Author(s):

Miwa OHNISHI ◽

Osamu MATSUOKA ◽

Hidenobu NOGI ◽

Tetsuo SAKAMOTO

Keyword(s):

Mass Spectrometry ◽

Focused Ion Beam ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Time Of Flight ◽

Tof Sims ◽

Ion Mass Spectrometry ◽

Secondary Ion

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A New Focused Ion Beam Optical System for a Time-of-flight-Secondary Ion Mass Spectrometry Instrument

Rapid Communications in Mass Spectrometry ◽

10.1002/(sici)1097-0231(19970131)11:2<175::aid-rcm725>3.0.co;2-k ◽

1997 ◽

Vol 11 (2) ◽

pp. 175-178 ◽

Cited By ~ 4

Author(s):

H. Shichi ◽

S. Osabe ◽

K. Kanehori

Keyword(s):

Mass Spectrometry ◽

Optical System ◽

Focused Ion Beam ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Time Of Flight ◽

Mass Spectrometry Instrument ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Combined electron and focused ion beam system for improvement of secondary ion yield in secondary ion mass spectrometry instrument

Applied Physics Letters ◽

10.1063/1.2362996 ◽

2006 ◽

Vol 89 (16) ◽

pp. 164103 ◽

Cited By ~ 1

Author(s):

L. Ji ◽

Q. Ji ◽

K.-N. Leung ◽

R. A. Gough

Keyword(s):

Mass Spectrometry ◽

Focused Ion Beam ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Mass Spectrometry Instrument ◽

Beam System ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Behavior of Gallium Secondary Ion Intensity in Gallium Focused Ion Beam Secondary Ion Mass Spectrometry

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.1287 ◽

1997 ◽

Vol 36 (Part 1, No. 3A) ◽

pp. 1287-1291 ◽

Cited By ~ 5

Author(s):

Tetsuo Sakamoto ◽

Masanori Owari ◽

Yoshimasa Nihei

Keyword(s):

Mass Spectrometry ◽

Focused Ion Beam ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Focused ion beam-secondary ion mass spectrometry analyses of nanostructured thin films

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2003.10.079 ◽

2004 ◽

Vol 180-181 ◽

pp. 323-330 ◽

Cited By ~ 6

Author(s):

A. Lamperti ◽

C.E. Bottani ◽

P.M. Ossi ◽

R. Levi-Setti

Keyword(s):

Mass Spectrometry ◽

Thin Films ◽

Focused Ion Beam ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Nanostructured Thin Films ◽

Ion Mass Spectrometry ◽

Secondary Ion

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