Optimizing a blend of a mixture slurry in chemical mechanical planarization for advanced semiconductor manufacturing using a posterior preference articulation approach to dual response surface optimization
2016 ◽
Vol 32
(5)
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pp. 648-659
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2012 ◽
Vol 40
(4)
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pp. 481-496
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2005 ◽
Vol 37
(3)
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pp. 236-247
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Keyword(s):
2012 ◽
Vol 39
(5)
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pp. 5900-5906
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2017 ◽
Vol 43
(3)
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pp. 164-175
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2015 ◽
Vol 2015
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pp. 1-6
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2008 ◽
Vol 57
(5)
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pp. 567-587
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Keyword(s):
2015 ◽
Vol 6
(4)
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pp. 469-480
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