scholarly journals Back Cover: Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition (Angew. Chem. Int. Ed. 51/2013)

2013 ◽  
Vol 52 (51) ◽  
pp. 13824-13824
Author(s):  
Brandon J. O'Neill ◽  
David H. K. Jackson ◽  
Anthony J. Crisci ◽  
Carrie A. Farberow ◽  
Fengyuan Shi ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Copper Catalysts ◽  
Back Cover ◽  
Layer Deposition

scholarly journals Rücktitelbild: Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition (Angew. Chem. 51/2013)

2013 ◽  
Vol 125 (51) ◽  
pp. 14068-14068 ◽  
Author(s):  
Brandon J. O'Neill ◽  
David H. K. Jackson ◽  
Anthony J. Crisci ◽  
Carrie A. Farberow ◽  
Fengyuan Shi ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Copper Catalysts ◽  
Layer Deposition

Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition

2013 ◽  
Vol 125 (51) ◽  
pp. 14053-14057 ◽  
Author(s):  
Brandon J. O'Neill ◽  
David H. K. Jackson ◽  
Anthony J. Crisci ◽  
Carrie A. Farberow ◽  
Fengyuan Shi ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Copper Catalysts ◽  
Layer Deposition

Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition

2013 ◽  
Vol 52 (51) ◽  
pp. 13808-13812 ◽  
Author(s):  
Brandon J. O'Neill ◽  
David H. K. Jackson ◽  
Anthony J. Crisci ◽  
Carrie A. Farberow ◽  
Fengyuan Shi ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Copper Catalysts ◽  
Layer Deposition

scholarly journals Butanol Dehydration over V2O5-TiO2/MCM-41 Catalysts Prepared via Liquid Phase Atomic Layer Deposition

Materials ◽  
2013 ◽  
Vol 6 (5) ◽  
pp. 1718-1729 ◽  
Author(s):  
Hyeonhee Choi ◽  
Jung-Hyun Bae ◽  
Do Kim ◽  
Young-Kwon Park ◽  
Jong-Ki Jeon
Keyword(s):  
Liquid Phase ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Mcm 41

Electrical and Structural Properties of Ruthenium Film Grown by Atomic Layer Deposition Using Liquid-Phase Ru(CO)3(C6H8) Precursor

2007 ◽  
Vol 990 ◽  
Author(s):  
Sung-Hoon Chung ◽  
Vladislav Vasilyev ◽  
Evgeni Gorokhov ◽  
Yong-Won Song ◽  
Hyuk-Kyoo Jang
Keyword(s):  
Liquid Phase ◽  
Atomic Layer Deposition ◽  
Annealing Temperature ◽  
Atomic Layer ◽  
Grazing Incidence ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates ◽  
Layer Deposition ◽  
Structural And Electrical Properties

ABSTRACTWe investigated effects of thermal annealing on Ru films deposited on the 8 inch Si substrates using a volatile liquid-phase Ru precursor, tricarbonyl-1,3-cyclohexadienyl ruthenium (Ru(CO)3(C6H8)) by an atomic layer deposition (ALD) technique. Structural and electrical properties of the films were characterized by scanning probe microscopy, X-ray diffractometry, sheet resistance. Grazing incidence X-ray diffraction (GIXRD) patterns show typical Ru hexagonal polycrystalline peaks as annealing temperature was increased. At the highest annealing temperature condition, Ta = 700 °C electrical resistivity become 6 times less than in as-deposited films.

scholarly journals Atomic Layer Deposition: Atomic Layer Deposition on Dispersed Materials in Liquid Phase by Stoichiometrically Limited Injections (Adv. Mater. 52/2019)

2019 ◽  
Vol 31 (52) ◽  
pp. 1970373 ◽  
Author(s):  
Benjamin P. Le Monnier ◽  
Frederick Wells ◽  
Farzaneh Talebkeikhah ◽  
Jeremy S. Luterbacher
Keyword(s):  
Liquid Phase ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition
Sign in / Sign up

Export Citation Format

Share Document