Integration of High‐Performance Cost‐Effective Copper‐Metal‐Organic‐Nanocluster‐based Gate Dielectric for Next‐Generation CMOS Applications
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2018 ◽
Vol 275
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pp. 133-144
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2019 ◽
Vol 7
(4)
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pp. 1725-1736
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2016 ◽
Vol 94
(12)
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pp. 1109-1118
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