scholarly journals Atomic Layer Deposition of Vanadium Oxide as Hole‐Selective Contact for Crystalline Silicon Solar Cells

2020 ◽  
Vol 6 (8) ◽  
pp. 2000467 ◽  
Author(s):  
Xinbo Yang ◽  
Hang Xu ◽  
Wenzhu Liu ◽  
Qunyu Bi ◽  
Lujia Xu ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Vanadium Oxide ◽  
Crystalline Silicon ◽  
Atomic Layer ◽  
Silicon Solar Cells ◽  
Crystalline Silicon Solar Cells ◽  
Layer Deposition

scholarly journals Atomic layer deposition of vanadium oxide films for crystalline silicon solar cells

2021 ◽  
Author(s):  
Eloi Ros Costals ◽  
Gerard Masmitjà ◽  
Estefania Rosa Almache ◽  
Benjamin andres Pusay ◽  
Kunal Tiwari ◽  
...  
Keyword(s):  
Solar Cells ◽  
Transition Metal Oxides ◽  
High Efficiency ◽  
Thermal Evaporation ◽  
Crystalline Silicon ◽  
Atomic Layer ◽  
Silicon Solar Cells ◽  
Deposition Technique ◽  
Crystalline Silicon Solar Cells ◽  
Layer Deposition

Transition Metal Oxides (TMOs) are promising materials to develop selective contacts on high-efficiency crystalline silicon solar cells. Nevertheless, the standard deposition technique used for TMOs is thermal evaporation, which could...

scholarly journals Spatial Atomic Layer Deposition of Aluminum Oxide as a Passivating Hole Contact for Silicon Solar Cells

2020 ◽  
Vol 217 (18) ◽  
pp. 2000348
Author(s):  
Kortan Öğütman ◽  
Nafis Iqbal ◽  
Geoffrey Gregory ◽  
Mengjie Li ◽  
Michael Haslinger ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Silicon Solar Cells ◽  
Layer Deposition

scholarly journals Atomic layer deposition of vanadium oxide to reduce parasitic absorption and improve stability in n–i–p perovskite solar cells for tandems

2019 ◽  
Vol 3 (6) ◽  
pp. 1517-1525 ◽  
Author(s):  
James A. Raiford ◽  
Rebecca A. Belisle ◽  
Kevin A. Bush ◽  
Rohit Prasanna ◽  
Axel F. Palmstrom ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Vanadium Oxide ◽  
Perovskite Solar Cells ◽  
Atomic Layer ◽  
Hole Transport ◽  
Layer Deposition ◽  
Improve Stability

ALD vanadium oxide and a low-absorbing hole transport material (HTM) enable semi-transparent perovskite solar cells with high photocurrent and thermal stability.

scholarly journals Atomic Layer Deposition TiO2 Films and TiO2/SiNx Stacks Applied for Silicon Solar Cells

2016 ◽  
Vol 6 (8) ◽  
pp. 233 ◽  
Author(s):  
Zu-Po Yang ◽  
Hsyi-En Cheng ◽  
I-Hsuan Chang ◽  
Ing-Song Yu
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Silicon Solar Cells ◽  
Tio2 Films ◽  
Layer Deposition

The Business of Fast ALD Equipment for Depositing Alumina Passivation Layers on Crystalline Silicon Solar Cells.

2011 ◽  
Vol 1353 ◽  
Author(s):  
Ad Vermeer ◽  
Roger Gortzen ◽  
P. Poodt ◽  
F. Roozeboom
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
High Throughput ◽  
Crystalline Silicon ◽  
Atomic Layer ◽  
Silicon Solar Cells ◽  
Alumina Layer ◽  
Solar Cell Efficiency ◽  
Crystalline Silicon Solar Cells ◽  
Cell Efficiency

ABSTRACTAtomic Layer Deposition (ALD) is a gas phase deposition technique for depositing very high quality thin films with an unsurpassed conformality. The main drawback of ALD however is the very low deposition rate (~ 1 nm/min). Recently, record deposition rates for alumina of up to 1 nm/s were reached using spatial ALD, while maintaining the typical assets regarding film quality as obtained by conventional, slow ALD [1]. This allows for ALD at high throughput numbers.One interesting application is passivation of crystalline silicon solar cells. Applying a thin alumina layer is reported to increase solar cell efficiency and enables the use of thinner wafers, thus reducing the main cost factor [2]. In this paper we report on the latest progress made by SoLayTec that delivered a working prototype of a system realizing full area single sided deposition of alumina on 156 x 156 mm2, mono- and multi crystalline silicon wafers for solar cell applications. The alumina layers showed excellent passivation. Based on this concept, a high-throughput ALD deposition tool is being developed targeting throughput numbers of up to 3000 wafers/hr. Finally, we report on the process of commercializing this technology.

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