scholarly journals Atomic and Molecular Layer Deposition of Hybrid Mo-Thiolate Thin Films with Enhanced Catalytic Activity

2018 ◽  
Vol 28 (26) ◽  
pp. 1800852 ◽  
Author(s):  
Callisto MacIsaac ◽  
Joel R. Schneider ◽  
Richard G. Closser ◽  
Thomas R. Hellstern ◽  
David S. Bergsman ◽  
...  
Keyword(s):  
Thin Films ◽  
Catalytic Activity ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition

Growth of Hybrid Chiral Thin Films by Molecular Layer Deposition Zinc/Cysteine as a Case Study

2021 ◽  
pp. 2101725
Author(s):  
Reut Yemini ◽  
Shalev Blanga ◽  
Hagit Aviv ◽  
Ilana Perelshtein ◽  
Eti Teblum ◽  
...  
Keyword(s):  
Thin Films ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition

scholarly journals MOF thin films with bi-aromatic linkers grown by molecular layer deposition

2020 ◽  
Vol 8 (5) ◽  
pp. 2539-2548 ◽  
Author(s):  
Kristian Blindheim Lausund ◽  
Malin Solheim Olsen ◽  
Per-Anders Hansen ◽  
Håkon Valen ◽  
Ola Nilsen
Keyword(s):  
Thin Films ◽  
Molecular Layer ◽  
Metal Organic Frameworks ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Wide Range ◽  
Metal Organic ◽  
Sensor Materials

Thin films of metal–organic frameworks (MOFs) are promising for a wide range of applications including membranes for separations and sensor materials in microelectronics.

Fabrication of Organic Thin Films for Copper Diffusion Barrier Layers Using Molecular Layer Deposition

2010 ◽  
Vol 1249 ◽  
Author(s):  
Stacey Bent ◽  
Paul William Loscutoff ◽  
Scott Clendenning
Keyword(s):  
Thin Films ◽  
Diffusion Barrier ◽  
Molecular Layer ◽  
Organic Thin Films ◽  
Barrier Properties ◽  
Diffusion Barriers ◽  
Molecular Layer Deposition ◽  
Copper Diffusion ◽  
Barrier Layers ◽  
Layer Deposition

AbstractDevice scaling predicts that copper barrier layers of under 3 nm in thickness will soon be needed in back-end processing for integrated circuits, motivating the development of new barrier layer materials. In this work, nanoscale organic thin films for use as possible copper diffusion barrier layers are deposited by molecular layer deposition (MLD) utilizing a series of self-limiting reactions of organic molecules. MLD can be used to tailor film properties to optimize desirable barrier properties, including density, copper surface adhesion, thermal stability, and low copper diffusion. Three systems are examined as copper diffusion barriers, a polyurea film deposited by the reaction of 1,4-phenylene diisocyanate (PDIC) and ethylenediamine (ED), a polyurea film with a sulfide-modified backbone, and a polythiourea films using a modified coupling chemistry. Following deposition of the MLD films, copper is sputter deposited. The copper diffusion barrier properties of the film are tested through adhesion and annealing tests, including 4-point bend testing and TEM imaging to examine the level of copper penetration. The promise and challenges of MLD-formed organic copper diffusion barriers will be discussed.

scholarly journals New Hybrid Organic-Inorganic Thin Films by Molecular Layer Deposition for Rechargeable Batteries

2021 ◽  
Vol 9 ◽  
Author(s):  
Jian Liu ◽  
Jiajun Wang
Keyword(s):  
Thin Films ◽  
Molecular Layer ◽  
Lithium Ion ◽  
Rechargeable Batteries ◽  
Inorganic Materials ◽  
Future Research ◽  
Molecular Layer Deposition ◽  
Surface And Interface ◽  
Layer Deposition ◽  
Inorganic Thin Films

The design of multifunctional thin films holds the key to manipulate the surface and interface structure of the electrode and electrolyte in rechargeable batteries and achieve desirable performance for various applications. Molecular layer deposition (MLD) is an emerging thin-film technique with exclusive advantages of depositing hybrid organic-inorganic materials at a nanoscale level and with well tunable and unique properties that conventional thin films might not have. Herein, we provide a timely mini-review on the most recent progress in the surface chemistry and MLD process of novel hybrid organic-inorganic thin films and their applications as the anode, cathode, and solid electrolytes in lithium-ion batteries. Perspectives for future research in designing new MLD process and precursors, enriching MLD material library, and expanding their potential applications in other energy storage systems, are discussed at the end.

Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane

2020 ◽  
Vol 56 (62) ◽  
pp. 8778-8781
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgenii Modin ◽  
Mladen Petravić ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Ring Opening ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Ring Opening Reactions

Two consecutive vapor-to-solid ring opening reactions were applied for thin film siloxane polymerization by molecular layer deposition (MLD).

Molecular layer deposition of Li-ion conducting “Lithicone” solid electrolytes

2020 ◽  
Vol 56 (99) ◽  
pp. 15537-15540
Author(s):  
Eric Kazyak ◽  
Minjeong Shin ◽  
William S. LePage ◽  
Tae H. Cho ◽  
Neil P. Dasgupta
Keyword(s):  
Thin Films ◽  
Solid Electrolytes ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Li Ion ◽  
Ion Conducting

Molecular Layer Deposition (MLD) of “lithicone” thin films is demonstrated, which behave as ionically-conductive solid electrolytes for future battery applications.

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