scholarly journals Local electron heating in theIoplasma torus associated withIofrom HISAKI satellite observation

2015 ◽  
Vol 120 (12) ◽  
pp. 10,317-10,333 ◽  
Author(s):  
Fuminori Tsuchiya ◽  
Masato Kagitani ◽  
Kazuo Yoshioka ◽  
Tomoki Kimura ◽  
Go Murakami ◽  
...  
Keyword(s):  
Satellite Observation ◽  
Local Electron ◽  
Electron Heating

scholarly journals Local Electron Heating in Nanoscale Conductors

Nano Letters ◽  
2006 ◽  
Vol 6 (12) ◽  
pp. 2935-2938 ◽  
Author(s):  
Roberto D'Agosta ◽  
Na Sai ◽  
Massimiliano Di Ventra
Keyword(s):  
Local Electron ◽  
Electron Heating ◽  
Nanoscale Conductors

Heat transport from the region of local electron heating in a plasma

2001 ◽  
Vol 27 (8) ◽  
pp. 652-658 ◽  
Author(s):  
V. G. Ledenev ◽  
A. P. Starygin
Keyword(s):  
Heat Transport ◽  
Local Electron ◽  
Electron Heating

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Modeling proton and electron heating in the fast solar wind

2020 ◽  
Author(s):  
L. Adhikari ◽  
G.P. Zank ◽  
L.-L. Zhao ◽  
M. Nakanotani ◽  
S. Tasnim
Keyword(s):  
Solar Wind ◽  
Fast Solar Wind ◽  
Electron Heating

Analysis of Operation Margin and Read Speed in 6T- and 8T-SRAM with Local Electron Injected Asymmetric Pass Gate Transistor

2012 ◽  
Vol E95-C (4) ◽  
pp. 564-571 ◽  
Author(s):  
Kousuke MIYAJI ◽  
Kentaro HONDA ◽  
Shuhei TANAKAMARU ◽  
Shinji MIYANO ◽  
Ken TAKEUCHI
Keyword(s):  
Local Electron
Sign in / Sign up

Export Citation Format

Share Document