Formation of periodic microswelling structures on silicone rubber surface using ArF excimer laser to realize superhydrophobic property

2017 ◽  
Vol 56 (7) ◽  
pp. 072002 ◽  
Author(s):  
Hidetoshi Nojiri ◽  
Wisnu Setyo Pambudi ◽  
Masayuki Okoshi
Keyword(s):  
Excimer Laser ◽  
Silicone Rubber ◽  
Rubber Surface ◽  
Superhydrophobic Property ◽  
Arf Excimer Laser

scholarly journals Fabrication of Superhydrophobic Silicone Rubber with Periodic Micro/Nano-Suction Cup Structure by ArF Excimer Laser-Induced Photodissociation

Nanomaterials ◽  
2019 ◽  
Vol 9 (6) ◽  
pp. 870 ◽  
Author(s):  
Masayuki Okoshi
Keyword(s):  
Excimer Laser ◽  
Silicone Rubber ◽  
Focal Point ◽  
Pulse Number ◽  
Entire Surface ◽  
Suction Cup ◽  
Atomic Force ◽  
Superhydrophobic Property ◽  
Arf Excimer Laser ◽  
193 Nm

A 193-nm ArF excimer laser was used to induce the photodissociation of Si–O bonds of silicone rubber in order to fabricate a periodic micro/nano-suction cup silicone structure, approximately 1 μm in diameter and 2 μm in height at regular intervals of 2.5 μm. The laser was focused on Al-coated silicone rubber by each silica glass microsphere 2.5 μm in diameter, which covered the entire surface of the silicone rubber. The silicone rubber underneath each microsphere photochemically swelled after laser-ablating the coated Al to limit the diameter of the swelling. Simultaneously, the coated Al was able to adjust the focal point to the surface of the silicone rubber to form a hole approximately 500 nm in diameter, centered at the swollen silicone. The dependences of the thickness of the coated-Al and the laser pulse number are discussed, based on the observations of a scanning electron microscope (SEM) and an atomic force microscope (AFM). The superhydrophobic property of the fabricated micro/nano-suction cup structure was successfully found.

White-Light Emission from Silicone Rubber Modified by 193 nm ArF Excimer Laser

2007 ◽  
Vol 46 (No. 15) ◽  
pp. L356-L358 ◽  
Author(s):  
Masayuki Okoshi ◽  
Daisuke Sekine ◽  
Narumi Inoue ◽  
Tsugito Yamashita
Keyword(s):  
Excimer Laser ◽  
White Light ◽  
Silicone Rubber ◽  
Light Emission ◽  
White Light Emission ◽  
Arf Excimer Laser ◽  
193 Nm

scholarly journals Photochemical Micro-/Nano-Swelling of Silicone Rubber Induced by Long Pulse-Repetition Interval of an ArF Excimer Laser

2021 ◽  
Vol 2 (2) ◽  
pp. 116-124
Author(s):  
Masayuki Okoshi
Keyword(s):  
Excimer Laser ◽  
Silicone Rubber ◽  
Early Stage ◽  
Pulse Number ◽  
Pulse Repetition ◽  
Atomic Force ◽  
Arf Excimer Laser ◽  
Repetition Interval ◽  
193 Nm ◽  
Long Pulse

Long pulse-repetition intervals of 100 to 500 ms of a 193 nm ArF excimer laser successfully increased the height of the photochemical micro-/nano-swelling of silicone rubber, observed with a scanning electron microscope. The effect of the interval was seen despite the heating of the silicone rubber to 80 °C during laser irradiation. The height of the micro-/nano-swelling was saturated when the laser pulse number was 300 or greater, although each of the saturated heights of the micro-/nano-swelling formed by several pulse-repetition intervals was different. Thus, a second ArF excimer laser irradiated the growing micro-/nano-swelling before the saturation; the saturated height of the growing micro-/nano-swelling could be controlled by the pulse-repetition interval of the second ArF excimer laser. To examine the process of micro-/nano-swelling, an early stage of the growth was observed using an atomic force microscope; a dent structure of the micro-/nano-swelling was clearly recognized. In addition, a needle-like structure of the micro-/nano-swelling could be formed when silica glass microspheres were sparsely aligned.

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