New Bidirectional T-Shaped Triple-Gate n-Type Polycrystalline Silicon Thin-Film Transistors Formed by Low-Temperature Sequential Lateral Solidification Process to Reduce of Kink Effects

2011 ◽  
Vol 50 (3R) ◽  
pp. 034201
Author(s):  
Sung-Hwan Choi ◽  
Min-Koo Han
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Solidification Process ◽  
Silicon Thin Film ◽  
Sequential Lateral Solidification

Reliability of Low Temperature Polycrystalline Silicon Thin-Film Transistors with Ultrathin Gate Oxide

2007 ◽  
Vol 46 (7A) ◽  
pp. 4021-4027 ◽  
Author(s):  
Hitoshi Ueno ◽  
Yuta Sugawara ◽  
Hiroshi Yano ◽  
Tomoaki Hatayama ◽  
Yukiharu Uraoka ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Gate Oxide ◽  
Silicon Thin Film

Density of states in the channel material of low temperature polycrystalline silicon thin film transistors

2000 ◽  
Vol 266-269 ◽  
pp. 1279-1283 ◽  
Author(s):  
K Mourgues ◽  
A Rahal ◽  
T Mohammed-Brahim ◽  
M Sarret ◽  
J.P Kleider ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Density Of States ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Silicon Thin Film
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