Theoretical performance estimation of silicene, germanene, and graphene nanoribbon field-effect transistors under ballistic transport

2014 ◽  
Vol 7 (3) ◽  
pp. 035102 ◽  
Author(s):  
Shiro Kaneko ◽  
Hideaki Tsuchiya ◽  
Yoshinari Kamakura ◽  
Nobuya Mori ◽  
Matsuto Ogawa
2016 ◽  
Vol 55 (4S) ◽  
pp. 04EK01 ◽  
Author(s):  
Shuyan Hu ◽  
Guangxi Hu ◽  
Lingli Wang ◽  
Ran Liu ◽  
Lirong Zheng

2016 ◽  
Vol 6 (3) ◽  
pp. 265-270 ◽  
Author(s):  
Mahdiar Ghadiry ◽  
Harith Ahmad ◽  
Chong Wu Yi ◽  
Asrulnizam Abd Manaf

Plasmonics ◽  
2015 ◽  
Vol 11 (2) ◽  
pp. 573-577 ◽  
Author(s):  
Mahdiar Ghadiry ◽  
Harith Ahmad ◽  
Alieh Hivechi ◽  
Fatemeh Tavakoli ◽  
Asrulnizam Abd Manaf

Author(s):  
Raj Kumar ◽  
Shashi Bala ◽  
Arvind Kumar

To have enhanced drive current and diminish short channel effects, planer MOS transistors have migrated from single-gate devices to three-dimensional multi-gate MOSFETs. The gate-all-around nanowire field-effect transistor (GAA NWFET) and nanotube or double gate-all-around field-effect transistors (DGGA-NTFET) have been proposed to deal with short channel effects and performance relates issues. Nanowire and nanotube-based field-effect transistors can be considered as leading candidates for nanoscale devices due to their superior electrostatic controllability, and ballistic transport properties. In this work, the performance of GAA NWFETs and DGAA-NT FETs will be analyzed and compared. III-V semiconductor materials as a channel will also be employed due to their high mobility over silicon. Performance analysis of junctionless nanowire and nanotube FETs will also be compared and presented.


Sign in / Sign up

Export Citation Format

Share Document