scholarly journals Graphene-based field effect transistor with ion-gel film gate

2019 ◽  
Vol 68 (9) ◽  
pp. 097301
Author(s):  
Hang Song ◽  
Jie Liu ◽  
Chao Chen ◽  
Long Ba
2017 ◽  
Vol 110 (3) ◽  
pp. 033103 ◽  
Author(s):  
Jiao Xu ◽  
Jingyuan Jia ◽  
Shen Lai ◽  
Jaehyuk Ju ◽  
Sungjoo Lee

2020 ◽  
Vol 6 (7) ◽  
pp. 2000091 ◽  
Author(s):  
Hyun Bae Jeon ◽  
Gwang Hyuk Shin ◽  
Khang June Lee ◽  
Sung‐Yool Choi

2021 ◽  
pp. 1-1
Author(s):  
De-Sheng Liu ◽  
Usman Khan ◽  
Peihang Li ◽  
Mansoor Ali Khana ◽  
Jiang Wu ◽  
...  

Author(s):  
Dae Hyun Jung ◽  
Guen Hyung Oh ◽  
Sang-il Kim ◽  
TAEWAN KIM

Abstract A top-gate field-effect transistor (FET), based on monolayer (ML) tungsten disulfide (WS2), and with an ion-gel dielectric was developed. The high electrical contact resistance of the Schottky contacts at the n-type transition metal dichalcogenides/metal electrode interfaces often adversely affects the device performance. We report the contact resistance and Schottky barrier height of an FET with Au electrodes. The FET is based on ML WS2 that was synthesised using chemical vapour deposition and was assessed using the transfer-length method and low-temperature measurements. Raman and photoluminescence spectra were recorded to determine the optical properties of the WS2 layers. The ML WS2 FET with an ion-gel top gate dielectric exhibits n-type behaviour, with a mobility, on/off ratio of 1.97 cm2/V·s, 1.51×105, respectively.


2010 ◽  
Vol E93-C (5) ◽  
pp. 540-545 ◽  
Author(s):  
Dong Seup LEE ◽  
Hong-Seon YANG ◽  
Kwon-Chil KANG ◽  
Joung-Eob LEE ◽  
Jung Han LEE ◽  
...  

2014 ◽  
Vol E97.C (7) ◽  
pp. 677-682
Author(s):  
Sung YUN WOO ◽  
Young JUN YOON ◽  
Jae HWA SEO ◽  
Gwan MIN YOO ◽  
Seongjae CHO ◽  
...  

2019 ◽  
Vol 24 (4) ◽  
pp. 407-414
Author(s):  
Oksana V. Gubanova ◽  
◽  
Evgeniy V. Kuznetsov ◽  
Elena N. Rybachek ◽  
Alexander N. Saurov ◽  
...  

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