scholarly journals Enhancement mode AlGaN/GaN double heterostructure high electron mobility transistor with F plasma treatment

2016 ◽  
Vol 65 (3) ◽  
pp. 038501
Author(s):  
Wang Chong ◽  
Zhao Meng-Di ◽  
Pei Jiu-Qing ◽  
He Yun-Long ◽  
Li Xiang-Dong ◽  
...  
2019 ◽  
Vol 217 (7) ◽  
pp. 1900694
Author(s):  
Uiho Choi ◽  
Donghyeop Jung ◽  
Kyeongjae Lee ◽  
Taemyung Kwak ◽  
Taehoon Jang ◽  
...  

2006 ◽  
Vol 45 (No. 35) ◽  
pp. L932-L934 ◽  
Author(s):  
Li-Hsin Chu ◽  
Heng-Tung Hsu ◽  
Edward-Yi Chang ◽  
Tser-Lung Lee ◽  
Sze-Hung Chen ◽  
...  

2015 ◽  
Vol 764-765 ◽  
pp. 486-490
Author(s):  
Chih Hao Wang ◽  
Liang Yu Su ◽  
Finella Lee ◽  
Jian Jang Huang

We demonstrate a novel design of large-size device in AlGaN/GaN high-electron-mobility transistor (HEMT). Depletion mode (D-mode) HEMTs and enhancement mode (E-mode) HEMTs are fabricated in our research. The saturation current of D-mode HEMTs is over 6A. By using Cascode structure, the D-mode HEMT becomes a normally-off device efficiently, and the threshold voltage of it rises from-7V to 2V. By using BCB (Benzocyclobutene) as the passivation, the E-mode HEMT shows an excellent characteristic. Also, when the VGS of the E-mode HEMT is over 9V, it still shows a good performance.


2017 ◽  
Vol 26 (4) ◽  
pp. 047305 ◽  
Author(s):  
Hui Wang ◽  
Ning Wang ◽  
Ling-Li Jiang ◽  
Xin-Peng Lin ◽  
Hai-Yue Zhao ◽  
...  

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