scholarly journals The effects of Ti ion-irradiation on critical current and flux pinning in MgB2 thin film

2012 ◽  
Vol 61 (19) ◽  
pp. 197401
Author(s):  
Wang Yin-Bo ◽  
Xue Chi ◽  
Feng Qing-Rong
Keyword(s):  
Thin Film ◽  
Critical Current ◽  
Flux Pinning ◽  
Ion Irradiation ◽  
Mgb2 Thin Film

Flux pinning in c-axis-oriented MgB2 thin film

2007 ◽  
Vol 467 (1-2) ◽  
pp. 101-105 ◽  
Author(s):  
Z.X. Shi ◽  
Y.X. Zhang ◽  
H. Lv ◽  
Mingxiang Xu ◽  
Eun-Mi Choi ◽  
...  
Keyword(s):  
Thin Film ◽  
Flux Pinning ◽  
Mgb2 Thin Film

Angular dependence of the critical current density and the temperature scaling of the flux pinning force in YBCO thin film

2018 ◽  
Vol 56 (2) ◽  
pp. 754-759
Author(s):  
Abdelhalim Hafid ◽  
Ahmed Taoufik ◽  
Abella Bouaaddi ◽  
Hassan Elouaddi ◽  
Ahmed Tirbiyine ◽  
...  
Keyword(s):  
Thin Film ◽  
Critical Current Density ◽  
Critical Current ◽  
Angular Dependence ◽  
Current Density ◽  
Flux Pinning ◽  
Pinning Force ◽  
Ybco Thin Film ◽  
Temperature Scaling ◽  
Flux Pinning Force

Microstructural characterization of YBa2Cu3O7-x thin films formed by metalorganic CVD

1991 ◽  
Vol 49 ◽  
pp. 1080-1081
Author(s):  
P. Lu ◽  
W. Huang ◽  
C.S. Chern ◽  
Y.Q. Li ◽  
J. Zhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Film Growth ◽  
Chemical Vapor ◽  
Microstructural Characterization ◽  
Ion Milling ◽  
Conventional Grinding

The YBa2Cu3O7-x thin films formed by metalorganic chemical vapor deposition(MOCVD) have been reported to have excellent superconducting properties including a sharp zero resistance transition temperature (Tc) of 89 K and a high critical current density of 2.3x106 A/cm2 or higher. The origin of the high critical current in the thin film compared to bulk materials is attributed to its structural properties such as orientation, grain boundaries and defects on the scale of the coherent length. In this report, we present microstructural aspects of the thin films deposited on the (100) LaAlO3 substrate, which process the highest critical current density.Details of the thin film growth process have been reported elsewhere. The thin films were examined in both planar and cross-section view by electron microscopy. TEM sample preparation was carried out using conventional grinding, dimpling and ion milling techniques. Special care was taken to avoid exposure of the thin films to water during the preparation processes.

Extraction of anisotropic critical current densities and flux pinning potentials

Cryogenics ◽  
1994 ◽  
Vol 34 (4) ◽  
pp. 329-334
Author(s):  
H.L Ji ◽  
Z.X Shi ◽  
Z.Y Zeng ◽  
X Jin ◽  
H.C Fan ◽  
...  
Keyword(s):  
Critical Current ◽  
Flux Pinning ◽  
Current Densities

125MeV Si9+ ion irradiation of calcium phosphate thin film coated by rf-magnetron sputtering technique

2011 ◽  
Vol 257 (6) ◽  
pp. 2134-2141 ◽  
Author(s):  
K. Elayaraja ◽  
M.I. Ahymah Joshy ◽  
R.V. Suganthi ◽  
S. Narayana Kalkura ◽  
M. Palanichamy ◽  
...  
Keyword(s):  
Thin Film ◽  
Calcium Phosphate ◽  
Magnetron Sputtering ◽  
Ion Irradiation ◽  
Rf Magnetron Sputtering

Critical current density and flux pinning in Gd1−xYxBa2Cu3O7−y epitaxial thin films

1995 ◽  
Vol 250 (1-2) ◽  
pp. 55-58 ◽  
Author(s):  
R.L. Wang ◽  
H.C. Li ◽  
B. Yin ◽  
J.W. Li ◽  
X.S. Ron ◽  
...  
Keyword(s):  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Flux Pinning ◽  
Epitaxial Thin Films
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