scholarly journals Improved performance of the dispenser cathode with a Re intermediate layer

2006 ◽  
Vol 55 (12) ◽  
pp. 6677
Author(s):  
Li Yu-Tao ◽  
Zhang Hong-Lai ◽  
Liu Pu-Kun ◽  
Zhang Ming-Chen
Keyword(s):  
Intermediate Layer ◽  
Dispenser Cathode ◽  
Improved Performance

Microstructure of YBa2Cu3O7-x thin films deposited by dc sputtering

1989 ◽  
Vol 47 ◽  
pp. 172-173
Author(s):  
O. Eibl ◽  
G. Gieres ◽  
H. Behner
Keyword(s):  
Thin Films ◽  
Cross Sections ◽  
Intermediate Layer ◽  
Amorphous State ◽  
Critical Currents ◽  
Dc Sputtering ◽  
State Process ◽  
Diffraction Patterns ◽  
Film Substrate ◽  
Substrate Temperatures

The microstructure of high-Tc YBa2Cu3O7-X thin films deposited by DC-sputtering on SrTiO3 substrates was analysed by TEM. Films were either (i) deposited in the amorphous state at substrate temperatures < 450°C and crystallised by a heat treatment at 900°C (process 1) or (ii) deposited at around 740°C in the crystalline state (process 2). Cross sections were prepared for TEM analyses and are especially useful for studying film substrate interdiffusion (fig.1). Films deposited in process 1 were polycristalline and the grain size was approximately 200 nm. Films were porous and the size of voids was approximately 100 nm. Between the SrTiO3 substrate and the YBa2Cu3Ox film a densly grown crystalline intermediate layer approximately 150 nm thick covered the SrTiO3 substrate. EDX microanalyses showed that the layer consisted of Sr, Ba and Ti, however, did not contain Y and Cu. Crystallites of the layer were carefully tilted in the microscope and diffraction patterns were obtained in five different poles for every crystallite. These patterns were consistent with the phase (Ba1-XSrx)2TiO4. The intermediate layer was most likely formed during the annealing at 900°C. Its formation can be understood as a diffusion of Ba from the amorphously deposited film into the substrate and diffusion of Sr from the substrate into the film. Between the intermediate layer and the surface of the film the film consisted of YBa2Cu3O7-x grains. Films prepared in process 1 had Tc(R=0) close to 90 K, however, critical currents were as low as jc = 104A/cm2 at 77 K.

Toward The Simultaneous Correction of Spherical and Chromatic Aberration in Electron Optics by Means of an Electrostatic Electron Mirror

1990 ◽  
Vol 48 (1) ◽  
pp. 206-207
Author(s):  
Gertrude. F. Rempfer
Keyword(s):  
Chromatic Aberration ◽  
Transverse Magnetic ◽  
Objective Lens ◽  
Ion Imaging ◽  
Corrected Image ◽  
Electric And Magnetic Fields ◽  
Chromatic Aberrations ◽  
Improved Performance ◽  
Electron Microscopes ◽  
Image Planes

Optimum performance in electron and ion imaging instruments, such as electron microscopes and probe-forming instruments, in most cases depends on a compromise either between imaging errors due to spherical and chromatic aberrations and the diffraction error or between the imaging errors and the current in the image. These compromises result in the use of very small angular apertures. Reducing the spherical and chromatic aberration coefficients would permit the use of larger apertures with resulting improved performance, granted that other problems such as incorrect operation of the instrument or spurious disturbances do not interfere. One approach to correcting aberrations which has been investigated extensively is through the use of multipole electric and magnetic fields. Another approach involves the use of foil windows. However, a practical system for correcting spherical and chromatic aberration is not yet available.Our approach to correction of spherical and chromatic aberration makes use of an electrostatic electron mirror. Early studies of the properties of electron mirrors were done by Recknagel. More recently my colleagues and I have studied the properties of the hyperbolic electron mirror as a function of the ratio of accelerating voltage to mirror voltage. The spherical and chromatic aberration coefficients of the mirror are of opposite sign (overcorrected) from those of electron lenses (undercorrected). This important property invites one to find a way to incorporate a correcting mirror in an electron microscope. Unfortunately, the parts of the beam heading toward and away from the mirror must be separated. A transverse magnetic field can separate the beams, but in general the deflection aberrations degrade the image. The key to avoiding the detrimental effects of deflection aberrations is to have deflections take place at image planes. Our separating system is shown in Fig. 1. Deflections take place at the separating magnet and also at two additional magnetic deflectors. The uncorrected magnified image formed by the objective lens is focused in the first deflector, and relay lenses transfer the image to the separating magnet. The interface lens and the hyperbolic mirror acting in zoom fashion return the corrected image to the separating magnet, and the second set of relay lenses transfers the image to the final deflector, where the beam is deflected onto the projection axis.

Bleaching optimization at WestRock mill in Covington, Virginia

TAPPI Journal ◽  
2016 ◽  
Vol 15 (9) ◽  
pp. 581-586 ◽  
Author(s):  
RICARDO B. SANTOS ◽  
PETER W. HART ◽  
DOUGLAS C. PRYKE ◽  
JOHN VANDERHEIDE
Keyword(s):  
Hydrogen Peroxide ◽  
Sodium Hydroxide ◽  
Chlorine Dioxide ◽  
Capital Expenditures ◽  
Equipment Repair ◽  
Optimization Program ◽  
Hardwood Pulp ◽  
Improved Performance

The WestRock mill in Covington, VA, USA, initiated a long term diagnostic and optimization program for all three of its bleaching lines. Benchmarking studies were used to help identify optimization opportunities. Capital expenditures for mixing improvement, filtrate changes, equipment repair, other equipment changes, and species changes were outside the scope of this work. This focus of this paper is the B line, producing southern hardwood pulp in a D(EP)DD sequence at 88% GE brightness. The benchmarking study and optimization work identified the following opportunities for improved performance: nonoptimal addition of caustic and hydrogen peroxide to the (EP) stage, carryover of D0 filtrate to the (EP) stage, and carryover of (EP) filtrate to the D1 stage. As a result of actions the mill undertook to address these opportunities, D0 kappa factor decreased about 5%, sodium hydroxide consumption in the (EP) stage decreased about 35%, chlorine dioxide consumption in the D1 stage decreased about 25%, and overall bleaching cost decreased about 15%.

Tunnel Magnetoresistance Effect for Double Tunnel Junctions with Al Intermediate Layer.

2001 ◽  
Vol 25 (4−2) ◽  
pp. 767-770 ◽  
Author(s):  
T. Daibou ◽  
M. Oogane ◽  
Y. Ando ◽  
C. Kim ◽  
O. Song ◽  
...  
Keyword(s):  
Intermediate Layer ◽  
Tunnel Junctions ◽  
Magnetoresistance Effect ◽  
Tunnel Magnetoresistance

Single-Phase AC-AC Current Source Converter with Improved Performance

2015 ◽  
Vol 135 (12) ◽  
pp. 1237-1238
Author(s):  
Yasuhiko Neba ◽  
Hirokazu Matsumoto ◽  
Yuta Kawasaki
Keyword(s):  
Single Phase ◽  
Current Source ◽  
Current Source Converter ◽  
Ac Current ◽  
Improved Performance

Improved Performance with New Casing while Drilling Bit Design Elements - Development and Case Studies

2011 ◽  
Author(s):  
Chay Yoeng Chung ◽  
Ahmad Hakam Abdul Razak ◽  
Ming Zo Tan ◽  
Sharp Ugwuocha ◽  
Eric Twardowski ◽  
...  
Keyword(s):  
Case Studies ◽  
Design Elements ◽  
Improved Performance ◽  
Drilling Bit
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