scholarly journals Near-field optical property of multi-layer dielectric gratings for pulse compressor

2006 ◽  
Vol 55 (9) ◽  
pp. 4588
Author(s):  
Liu Shi-Jie ◽  
Shen Jian ◽  
Shen Zi-Cai ◽  
Kong Wei-Jin ◽  
Wei Chao-Yang ◽  
...  
Keyword(s):  
Optical Property ◽  
Near Field ◽  
Pulse Compressor ◽  
Dielectric Gratings

Near-field optical properties of multilayer ridge metal/multilayer-dielectric gratings for pulse compressor

2015 ◽  
Author(s):  
Heyuan Guana ◽  
Chenze Huang ◽  
Zhe Chen ◽  
Yunxia Jin ◽  
Kui Yi ◽  
...  
Keyword(s):  
Optical Properties ◽  
Near Field ◽  
Pulse Compressor ◽  
Dielectric Gratings ◽  
Multilayer Dielectric

Near-field optical properties of wide bandwidth metal multi-layer dielectric gratings for pulse compressor

2013 ◽  
Vol 114 (4) ◽  
pp. 557-565 ◽  
Author(s):  
Heyuan Guan ◽  
Yunxia Jin ◽  
Shijie Liu ◽  
Fanyu Kong ◽  
Yin Du ◽  
...  
Keyword(s):  
Optical Properties ◽  
Near Field ◽  
Wide Bandwidth ◽  
Pulse Compressor ◽  
Dielectric Gratings

Optimization of near-field optical field of multi-layer dielectric gratings for pulse compressor

2006 ◽  
Vol 267 (1) ◽  
pp. 50-57 ◽  
Author(s):  
Shijie Liu ◽  
Zicai Shen ◽  
Weijing Kong ◽  
Jian Shen ◽  
Zhenxia Deng ◽  
...  
Keyword(s):  
Near Field ◽  
Optical Field ◽  
Pulse Compressor ◽  
Dielectric Gratings

Analysis of the near field image formation of dielectric gratings

1995 ◽  
Vol 57 (2-3) ◽  
pp. 153-159 ◽  
Author(s):  
Yong Chen ◽  
R.K. Kupka
Keyword(s):  
Near Field ◽  
Image Formation ◽  
Dielectric Gratings

Multilayer dielectric gratings for ultrashort pulse compressor

2006 ◽  
Author(s):  
Yaping Dai ◽  
Shijie Liu ◽  
Hongbo He ◽  
Jianda Shao ◽  
Kui Yi ◽  
...  
Keyword(s):  
Ultrashort Pulse ◽  
Pulse Compressor ◽  
Dielectric Gratings ◽  
Multilayer Dielectric

Optimization of the optical near-field distribution of metal multilayer dielectric gratings for pulse compressors

2013 ◽  
Author(s):  
Heyuan Guan ◽  
Yunxia Jin ◽  
Shijie Liu ◽  
Fanyu Kong ◽  
Yin Du ◽  
...  
Keyword(s):  
Field Distribution ◽  
Near Field ◽  
Dielectric Gratings ◽  
Multilayer Dielectric

The analysis of near and far field pattern through mode analysis and FFT in a finite periodic dielectric gratings

2015 ◽  
Vol 17 (1) ◽  
pp. 82-90 ◽  
Author(s):  
Tae-Bong Lee ◽  
Min-Nyeon Kim
Keyword(s):  
Near Field ◽  
Bloch Wave ◽  
Wave Number ◽  
Mode Analysis ◽  
Field Pattern ◽  
Far Field ◽  
Content Type ◽  
Coupled Method ◽  
Field Patterns ◽  
Dielectric Gratings

Purpose – The purpose of this paper is to analyze far and near field emitted field patterns through more exact calculation of the modes formed in finite periodic dielectric gratings. Design/methodology/approach – For the mode calculation, equations are newly defined by applying vertical boundary condition on the assumption that transverse electric modes are generated in the structure. After finding modes, near field patterns are calculated using the wave number and coefficient of the mode. Findings – Additionally, the results from these calculations are compared with that of the rigorous-coupled method. Finally, far field patterns are derived by applying fast Fourier transform to near field patterns and also compared with the results of rigorous-coupled method. Research limitations/implications – For convenience of coordinate, we use rectangular coordinate, though the shape of radome is a hemisphere. Practical implications – In this paper, the authors derive more exact near field patterns without the assumption of infiniteness so that these results can be used practically for a making real frequency-selective structure. Originality/value – Conventional periodic finite dielectric gratings analysis has been done using Floquet–Bloch wave theory, coupled-mode, rigorous-coupled method which is based on the assumption of infiniteness of the structure.

Near-field scanning optical microscopy

1986 ◽  
Vol 44 ◽  
pp. 642-643
Author(s):  
E. Betzig ◽  
A. Harootunian ◽  
M. Isaacson ◽  
A. Lewis
Keyword(s):  
Near Field ◽  
Optical Microscope ◽  
Visible Radiation ◽  
Field Methods ◽  
Optical Elements ◽  
Optical Region ◽  
Order Of Magnitude ◽  
Nondestructive Imaging ◽  
Scanning Optical Microscopy ◽  
Near Field Scanning

In general, conventional methods of optical imaging are limited in spatial resolution by either the wavelength of the radiation used or by the aberrations of the optical elements. This is true whether one uses a scanning probe or a fixed beam method. The reason for the wavelength limit of resolution is due to the far field methods of producing or detecting the radiation. If one resorts to restricting our probes to the near field optical region, then the possibility exists of obtaining spatial resolutions more than an order of magnitude smaller than the optical wavelength of the radiation used. In this paper, we will describe the principles underlying such "near field" imaging and present some preliminary results from a near field scanning optical microscope (NS0M) that uses visible radiation and is capable of resolutions comparable to an SEM. The advantage of such a technique is the possibility of completely nondestructive imaging in air at spatial resolutions of about 50nm.

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