scholarly journals THE MAGNETORESISTIVE EFFECT OF p-TYPE SEMICONDUCTING DIAMOND FILMS

2001 ◽  
Vol 50 (8) ◽  
pp. 1616
Author(s):  
KONG GHUN-YANG ◽  
WANG WAN-LU ◽  
LIAO KE-JUN ◽  
MA YONG ◽  
WANG SHU-XIA ◽  
...  
Keyword(s):  
Diamond Films ◽  
Semiconducting Diamond ◽  
P Type ◽  
Magnetoresistive Effect

Cold Cathode of p-Type Semiconducting Diamond Films for Gas Discharge

2007 ◽  
Vol 4 (S1) ◽  
pp. S942-S945 ◽  
Author(s):  
Akimitsu Hatta ◽  
Hiroshi Nakatsuma ◽  
Keishi Yanai ◽  
Tsuyoshi Nishikawa
Keyword(s):  
Diamond Films ◽  
Gas Discharge ◽  
Cold Cathode ◽  
Semiconducting Diamond ◽  
P Type

Enhanced Transverse Magnetoresistive Effect in Semiconducting Diamond Films

2000 ◽  
Vol 17 (5) ◽  
pp. 370-372 ◽  
Author(s):  
Wang Wan-Lu ◽  
Liao Ke-Jun ◽  
Wang Bi-Ben
Keyword(s):  
Diamond Films ◽  
Semiconducting Diamond ◽  
Magnetoresistive Effect

Magnetoresistive effect inp-type semiconducting diamond films

2002 ◽  
Vol 91 (5) ◽  
pp. 3044-3048 ◽  
Author(s):  
C. Y. Kong ◽  
W. L. Wang ◽  
K. J. Liao ◽  
S. X. Wang ◽  
L. Fang ◽  
...  
Keyword(s):  
Diamond Films ◽  
Semiconducting Diamond ◽  
Magnetoresistive Effect

Investigations into the Magnetoresistive Effect of Semiconducting Diamond Films

2000 ◽  
Vol 7 (4) ◽  
pp. 319-331 ◽  
Author(s):  
C. Y. KONG ◽  
W. L. WANG ◽  
K. J. LIAO ◽  
S. X. WANG ◽  
L. FANG
Keyword(s):  
Diamond Films ◽  
Semiconducting Diamond ◽  
Magnetoresistive Effect

Characterization of homoepitaxial diamond films by Electron microscopy

1991 ◽  
Vol 49 ◽  
pp. 880-881
Author(s):  
D.P. Malta ◽  
S.A. Willard ◽  
R.A. Rudder ◽  
G.C. Hudson ◽  
J.B. Posthill ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Surface Defects ◽  
Substrate Surface ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Large Degree ◽  
Rf Plasma ◽  
Semiconducting Diamond

Semiconducting diamond films have the potential for use as a material in which to build active electronic devices capable of operating at high temperatures or in high radiation environments. A major goal of current device-related diamond research is to achieve a high quality epitaxial film on an inexpensive, readily available, non-native substrate. One step in the process of achieving this goal is understanding the nucleation and growth processes of diamond films on diamond substrates. Electron microscopy has already proven invaluable for assessing polycrystalline diamond films grown on nonnative surfaces.The quality of the grown diamond film depends on several factors, one of which is the quality of the diamond substrate. Substrates commercially available today have often been found to have scratched surfaces resulting from the polishing process (Fig. 1a). Electron beam-induced current (EBIC) imaging shows that electrically active sub-surface defects can be present to a large degree (Fig. 1c). Growth of homoepitaxial diamond films by rf plasma-enhanced chemical vapor deposition (PECVD) has been found to planarize the scratched substrate surface (Fig. 1b).

Magnetoresistance of a p-type Semiconducting Diamond

1957 ◽  
Vol 70 (5) ◽  
pp. 527-530 ◽  
Author(s):  
E W J Mitchell ◽  
P T Wedepohl
Keyword(s):  
Semiconducting Diamond ◽  
P Type

scholarly journals DEPOSITION CARBON NANOSTRUCTURES BY SURFATRON GENERATED DISCHARGE

2014 ◽  
Vol 54 (6) ◽  
pp. 389-393
Author(s):  
Marina Davydova ◽  
Jiri Smid ◽  
Zdenek Hubicka ◽  
Alexander Kromka
Keyword(s):  
Carbon Nanostructures ◽  
Treatment Time ◽  
Diamond Films ◽  
Diamond Surface ◽  
Process Time ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Gas Concentration ◽  
P Type ◽  
Wave Discharge

Carbon nanostructures were deposited by surface wave discharge using various Ar/CH<sub>4</sub>/ CO<sub>2</sub> gas mixture ratios. The morphology was controlled by adjusting of gas concentration and was investigated by scanning electron microscopy (SEM). Also, the influence of the low temperature plasma treatment and process time on the wettability of the diamond films has been studied. The results indicate that for hydrogen termination of diamond surface indicate that the temperature as low as 400°C and treatment time of 15 min is sufficient to attain the p-type surface conductivity of diamond.

Attempts to p-Dope Ultrananocrystalline Diamond Films in a Hot Filament Reactor

2006 ◽  
Vol 956 ◽  
Author(s):  
Paul William May ◽  
Matthew Hannaway
Keyword(s):  
Vapour Deposition ◽  
Film Growth ◽  
Substrate Surface ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Grain Sizes ◽  
Ultrananocrystalline Diamond ◽  
The Individual ◽  
P Type ◽  
Hot Filament

ABSTRACTUltrananocrystalline diamond (UNCD) films have been deposited using hot filament chemical vapour deposition using Ar/CH4/H2 gas mixtures plus additions of B2H6 in an attempt to make p-type semiconducting films. With increasing additions of B2H6 from 0 to 40,000 ppm with respect to C, the film growth rate was found to decrease substantially, whilst the individual grain sizes increased from nm to μm. With 40,000 ppm of B2H6, crystals of boric oxide were found on the substrate surface, which slowly hydrolysed to boric acid on exposure to air. These results are rationalised using a model for UNCD growth based on competition for surface radical sites between CH3 and C atoms.

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