scholarly journals An Inductively-Coupled Plasma Source for the Gaseous Electronics Conference Rf Reference Cell

1995 ◽  
Vol 100 (4) ◽  
pp. 427 ◽  
Author(s):  
P.A. Miller ◽  
G.A. Hebner ◽  
K.E. Greenberg ◽  
P.D. Pochan ◽  
B.P. Aragon
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Reference Cell ◽  
Inductively Coupled ◽  
Gaseous Electronics Conference

Plasma Diagnostics in an Inductively Coupled Plasma - Gaseous Electronics Conference Reference Cell

2019 ◽  
Vol 14 (1) ◽  
pp. 365-373
Author(s):  
Andre M. Daltrini ◽  
Stanislav A. Moshkalev ◽  
Thomas Morgan ◽  
Robert Piejak ◽  
William Graham
Keyword(s):  
Plasma Diagnostics ◽  
Inductively Coupled Plasma ◽  
Reference Cell ◽  
Inductively Coupled ◽  
Gaseous Electronics Conference

Temperature Determination on a 9.2 MHz Inductively Coupled Plasma Source Using N2+ Bands as Monitor

1978 ◽  
Vol 32 (6) ◽  
pp. 572-576 ◽  
Author(s):  
P. B. Zeeman ◽  
S. P. Terblanche ◽  
K. Visser ◽  
F. H. Hamm
Keyword(s):  
Inductively Coupled Plasma ◽  
Band System ◽  
Plasma Source ◽  
Temperature Determination ◽  
First Order ◽  
Inductively Coupled ◽  
Plasma Tail

In recent experiments with a 9.2 MHz inductively coupled plasma assembly air was used as cooling gas. The molecular N2+ band system appeared on the photographic plates taken in the first order of a 3.4 m Jarrell-Ash Ebert grating spectrograph. The rotational lines of this band system was used to evaluate the temperature of the plasma tail flame at various heights above the load coil. These varied from approximately 8000°K at 17 mm above the coil to 6400 at 41 mm.

Simulations of a Feedback Control Scheme for an Inductively Coupled Plasma Source for Etching Applications

1996 ◽  
Vol 143 (4) ◽  
pp. 1375-1383 ◽  
Author(s):  
Naoki Yamada ◽  
Peter L. G. Ventzek ◽  
Y. Sakai ◽  
H. Tagashira ◽  
K. Kitamori
Keyword(s):  
Feedback Control ◽  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Inductively Coupled ◽  
Control Scheme
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