scholarly journals Silicon Growth Technologies for PV Applications

Author(s):  
Guilherme Manuel Morais Gaspar ◽  
Antoine Autruffe ◽  
José Mário Pó
Keyword(s):  
2003 ◽  
Vol 254 (3-4) ◽  
pp. 329-335 ◽  
Author(s):  
Woo-Seok Cheong ◽  
Seok-Kiu Lee ◽  
Jae-Sung Roh
Keyword(s):  

1994 ◽  
Vol 75 (8) ◽  
pp. 3900-3907 ◽  
Author(s):  
M. Eizenberg ◽  
F. Meyer ◽  
A. Benhocine ◽  
D. Bouchier

1993 ◽  
Vol 324 ◽  
Author(s):  
Chris M. Lawson ◽  
Robert R. Michael

AbstractWe report on the first use of optical low coherence reflectometry (OLCR) for Edge Defined Film-Fed Growth (EFG) silicon characterization. This OLCR sensor system has been used to measure horizontal profiles of silicon thickness and flatness to an accuracy of 1.5 Rim with the sensor head positioned 1 cm away from the silicon. The use of this noninvasive sensor for EFG silicon growth monitoring may lead to more efficient solar cell manufacturing processes.


1979 ◽  
Author(s):  
R V D'Aiello ◽  
P H Robinson ◽  
D Richman

1993 ◽  
Vol 140 (4) ◽  
pp. 1110-1117
Author(s):  
M. E. Grupen‐Shemansky ◽  
H. M. Liaw ◽  
B. Vasquez ◽  
S. L. Sundaram

1991 ◽  
Vol 115 (1-4) ◽  
pp. 542-550 ◽  
Author(s):  
J.G.E. Gardeniers ◽  
L.J. Giling

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