scholarly journals Diagnostics of a Crater Growth and Plasma Jet Evolution on Laser Pulse Materials Processing

Author(s):  
A. Yu. ◽  
S. V.
2021 ◽  
Vol 9 (2) ◽  
pp. 269-307
Author(s):  
Hom Bahadur Baniya ◽  
Rajesh Prakash Guragain ◽  
Deepak Prasad Subedi

This review summarizes the results of cold atmospheric pressure plasma technology application in polymers surface treatment. Attention is given to results of changes in the hydrophilic property of polymer surfaces by incorporation of polar functional groups when exposed to atmospheric pressure plasma, depending on the time of treatment, applied voltage, gas flow rate, and distance from the surface. We have successfully developed a plasma device that is able to generate cold atmospheric pressure argon plasma of low temperature (20 – 26) ° C downstream using a high-voltage power source which can be widely used in materials processing. Therefore, a cost-effective system of generating a plasma jet at atmospheric pressure with potential applications has been developed. Cold atmospheric pressure plasma jet (CAPPJ) has shown a lot of applications in recent years such as in materials processing, surface modification, and biomedical materials processing. CAPPJ has been generated by a high voltage (0-20 kV) and high frequency (20-30 kHz) power supply.<br/> The discharge has been characterized by optical and electrical methods. In order to characterize cold atmospheric pressure argon plasma jet, its electron density, electron temperature, rotational temperature, and vibration temperature have been determined using the power balance method, intensity ratio method, Stark broadening method, and Boltzmann plot method, respectively. The improvement in hydrophilicity of the cold plasma-treated polymer samples was characterized by contact angle measurements, surface free energy analysis, Fourier transform infrared (FTIR) spectroscopy, and scanning electron microscopy (SEM). Contact angle analysis showed that the discharge was effective in improving the wettability of polymers after the treatment. Furthermore, atmospheric plasma can be effectively used to remove surface contamination and to chemically modify different polymer surfaces. The chemical changes, especially oxidation and cross-linking, enhance the surface properties of the polymers.


2020 ◽  
Vol 8 (2) ◽  
pp. S1-S14
Author(s):  
Hom Bahadur Baniya ◽  
Rajesh Prakash Guragain ◽  
Binod Baniya ◽  
Deepak Prasad Subedi

The cold plasma technology is gaining popularity as one of the most effective tools for a wide range of applications. Cold atmospheric pressure plasma jet (CAPPJ) has attracted considerable attention in recent times for materials processing such as surface modification and biomedical applications. The cold atmospheric pressure plasma jet sustained in pure argon has been used here to modify the surface properties of polypropylene. CAPPJ has been generated by a high voltage power supply 5 kV at an operating frequency of 20 kHz. This paper reports the diagnostics of CAPPJ in argon environment by electrical and optical methods and its application in the surface modification of polypropylene (PP). The surface properties of the untreated and plasma-treated PP samples were characterized by contact angle measurements, surface free energy determination, scanning electron microscopy and Fourier transform infrared spectroscopy analysis. Most of the previous work has used RF power supply which is more expensive compared to the power supply used in the present study. The plasma jet is designed with locally available materials and can be used for continuous treatment for long time. We have successfully developed a plasma device that is able to generate a non-equilibrium atmospheric pressure argon plasma jet of low temperature. Therefore, a cost-effective system of generating a plasma jet at atmospheric pressure with potential applications in materials processing and biomedical research has been developed.


Author(s):  
A.G. Cullis

The evolution of semiconductor technology depends for its impetus upon continuing advances in materials processing. Over the past few years particularly dramatic advances have been made in the area of the pulsed annealing of semiconductors. The present article will be concerned with the use of Q-switched laser radiation for Si annealing - a technique which has received in-depth study?.1-4 As will be shown below, transmission electron microscope (TEM) analysis of annealed samples can give detailed information about the annealing mechanism and its associated characteristic phenomena.


2001 ◽  
Vol 124 (2) ◽  
pp. 275-283 ◽  
Author(s):  
C. H. Fan ◽  
J. Sun ◽  
J. P. Longtin

Dielectric (high bandgap) materials represent an important and diverse class of materials in micro and nanotechnology, including MEMS devices, biomedical and bioengineering systems, multilayer thin film coatings, fiber optics, etc. Micromachining dielectrics using ultrafast lasers is an exciting and promising new research area with many significant advantages, including precision material removal, negligible heating of the workpiece, micron and sub-micron-size feature fabrication, and high aspect ratio features. During ultrafast laser processing of dielectrics, the intense laser pulse ionizes the irradiated material and produces an optical breakdown region, or plasma, that is characterized by a high density of free electrons. These high-density electrons can efficiently absorb a large fraction of the laser irradiance energy, part of which will then be coupled into the bulk material, resulting in material removal through direct vaporization. The energy deposited into the material depends on the time and space-dependent breakdown region, the plasma rise time, and the plasma absorption coefficient. Higher coupling efficiency results in higher material removal rate; thus energy deposition is one of the most important issues for ultrafast laser materials processing, particularly for micron and sub-micron-scale laser materials processing. In the present work, a femtosecond breakdown model is developed to investigate energy deposition during ultrafast laser material interactions. One substantial contribution of the current work is that pulse propagation effects have been taken into account, which have been shown to become significant for pulse durations less than 10 ps. By accounting for the pulse propagation, the time and space-resolved plasma evolution can be characterized and used to determine the energy deposition through plasma absorption. With knowledge of the plasma absorption, changes in the pulse profile as it propagates in the focal region can be determined as well. Absorption of the laser pulse by plasma in water is compared with experimental data to validate the model, as water is a well characterized dielectric. The model, however, is also applicable to other transparent or moderately absorbing solid and liquid dielectric media during ultrafast laser-materials interactions.


1997 ◽  
Vol 7 (6) ◽  
pp. 1361-1375 ◽  
Author(s):  
O. H. Chang ◽  
A. Kaminska ◽  
M. Dudeck
Keyword(s):  

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