scholarly journals Thermal Treatments and Activation Procedures Used in the Preparation of Activated Carbons

Author(s):  
Virginia Hernndez-Montoya ◽  
Josafat Garca-Servin ◽  
Jos Ivn
2020 ◽  
Vol 6 (3) ◽  
pp. 56
Author(s):  
María José Mostazo-López ◽  
Ramiro Ruiz-Rosas ◽  
Tomomi Tagaya ◽  
Yoshikiyo Hatakeyama ◽  
Soshi Shiraishi ◽  
...  

Nitrogen functionalization of a highly microporous activated carbon (SBET > 3000 m2/g), to be used as electrode of electric double layer capacitor (EDLC), was carried out by different methods based on organic chemistry protocols at low temperature and selective thermal post-treatments under inert atmosphere. The combination of both methods allowed the production of carbon materials with very similar surface area (2400–3000 m2/g) and different surface chemistry. The nitrogen functionalization by chemical methods produce the attachment of 4 at. % N (XPS) by consumption of oxygen functional groups. The thermal treatments rearrange the surface chemistry by decreasing and converting both nitrogen and oxygen moieties. The effect of surface chemistry on the performance of these materials as electrodes for symmetric supercapacitors was analyzed in organic electrolyte (1M TEMABF4/propylene carbonate). The devices showed high gravimetric capacitance (37–40 F/g) and gravimetric energy density (31–37 Wh/kg). The electrochemical stability of the EDLC was evaluated by a floating test under severe conditions of voltage and temperature. The results evidence an improvement of the durability of nitrogen-doped activated carbons modified by chemical treatments due to the decrease of detrimental oxygen functionalities and the generation of nitrogen groups with higher electrochemical stability.


2009 ◽  
Vol 59 (7) ◽  
pp. 1371-1376 ◽  
Author(s):  
A. Anfruns ◽  
C. Canals-Batlle ◽  
A. Ros ◽  
M. A. Lillo-Ródenas ◽  
A. Linares-Solano ◽  
...  

This paper discusses H2S, NH3 and VOCs removal by sewage-sludge-derived materials with outstanding chemical and textural properties. These materials were obtained from different precursors using different chemical and thermal treatments. Results show that the H2S removal process entailed a catalytic conversion of H2S to S or SO42− species. On the other hand, adsorption is the main mechanism governing the performance of sludge-based materials for NH3 and VOCs. Retention capacities (x/M values) obtained for some of the sludge–based adsorbents/catalysts are similar to those obtained with commercial activated carbons selected as reference materials.


2016 ◽  
Vol 188 (4-5) ◽  
pp. 581-593 ◽  
Author(s):  
A. Erto ◽  
B. Tsyntsarski ◽  
M. Balsamo ◽  
T. Budinova ◽  
A. Lancia ◽  
...  

Author(s):  
M.T. Jahn ◽  
J.C. Yang ◽  
C.M. Wan

4340 Ni-Cr-Mo alloy steel is widely used due to its good combination of strength and toughness. The mechanical property of 4340 steel can be improved by various thermal treatments. The influence of thermomechanical treatment (TMT) has been studied in a low carbon Ni-Cr-Mo steel having chemical composition closed to 4340 steel. TMT of 4340 steel is rarely examined up to now. In this study we obtain good improvement on the mechanical property of 4340 steel by TMT. The mechanism is explained in terms of TEM microstructures4340 (0.39C-1.81Ni-0.93Cr-0.26Mo) steel was austenitized at 950°C for 30 minutes. The TMTed specimen (T) was obtained by forging the specimen continuously as the temperature of the specimen was decreasing from 950°C to 600°C followed by oil quenching to room temperature. The thickness reduction ratio by forging is 40%. The conventional specimen (C) was obtained by quenching the specimen directly into room temperature oil after austenitized at 950°C for 30 minutes. All quenched specimens (T and C) were then tempered at 450, 500, 550, 600 or 650°C for four hours respectively.


Author(s):  
V. C. Kannan ◽  
S. M. Merchant ◽  
R. B. Irwin ◽  
A. K. Nanda ◽  
M. Sundahl ◽  
...  

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.


2012 ◽  
Vol 2 (6) ◽  
pp. 60-63
Author(s):  
R. P. Suresh Jeyakumar ◽  
◽  
Dr. V. Chandrasekaran Dr. V. Chandrasekaran

Sign in / Sign up

Export Citation Format

Share Document