scholarly journals Improving the Light-Emitting Efficiency of GaN LEDs Using Nanoimprint Lithography

10.5772/20712 ◽  
2011 ◽  
Author(s):  
Yeeu-Chang Lee ◽  
Sheng-Han Tu
Keyword(s):  
Nanoimprint Lithography ◽  
Light Emitting

Fabrication of Micro-OLEDs by Room-temperature Curing Nanocontact-print Lithography Using DLC Molds

2012 ◽  
Vol 1511 ◽  
Author(s):  
Ippei Ishikawa ◽  
Keisuke Sakurai ◽  
Shuji Kiyohara ◽  
Taisuke Okuno ◽  
Hideto Tanoue ◽  
...  
Keyword(s):  
Indium Tin Oxide ◽  
Nanoimprint Lithography ◽  
Room Temperature ◽  
Hole Transport ◽  
Transport Layer ◽  
Electron Transport Layer ◽  
Insulating Layer ◽  
Light Emitting ◽  
Light Emitting Devices ◽  
Ito Glass

ABSTRACTThe microfabrication technologiesfor organic light-emitting devices (OLEDs) are essential to the fabrication of the next generation of light-emitting devices. The micro-OLEDs fabricated by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds have been investigated. However, light emissions from 10 μm-square-dot OLEDs fabricated by the RTC-NIL method have not been uniform. Therefore, we proposed the fabrication of micro-OLEDs by room-temperature curing nanocontact-print lithography (RTC-NCL) using the diamond-like carbon (DLC) mold. The DLC molds used in RTC-NCL were fabricated by an electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in electron beam (EB) lithography technology. The mold patterns are square and rectangle dots which has 10 µm-width, 10 µm-width and50 µm-length, respectively. The height of the patterns is 500 nm. The DLC molds were used to form the insulating layer of polysiloxane in RTC-NCL. We carried out the RTC-NCL process using the DLC mold under the following optimum conditions: 0.1 MPa-pressure for coating DLC mold with polysiloxane film, 2.1 MPa-pressure for transferring polysiloxane from DLC mold pattern to indium tin oxide (ITO) glass substrate. We deposited N, N'-Diphenyl -N, N'-di (m-tolyl)benzidine (TPD) [40 nm-thickness] as hole transport layer / Tris(8-quinolinolato)aluminum (Alq3) [40 nm-thickness] as electron transport layer / Al [200 nm-thickness] as cathode on ITO glass substrateas anode in this order. We succeeded in formation of the insulating layer with square and rectangle dots which has 10 µm-width,10 µm-width and 50 µm-length, and operation of micro-OLEDs by RTC-NIL using DLC molds.

Organic light-emitting diodes with photonic crystals on glass substrate fabricated by nanoimprint lithography

2007 ◽  
Vol 90 (11) ◽  
pp. 111114 ◽  
Author(s):  
Kuniaki Ishihara ◽  
Masayuki Fujita ◽  
Ippei Matsubara ◽  
Takashi Asano ◽  
Susumu Noda ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Glass Substrate ◽  
Nanoimprint Lithography ◽  
Light Emitting Diodes ◽  
Organic Light Emitting Diodes ◽  
Light Emitting ◽  
Organic Light

Micro-organic Light-emitting Devices Fabricated by Room-temperature Curing Nanoimprint Lithography Using Diamond Molds

2012 ◽  
Vol 1395 ◽  
Author(s):  
Ippei Ishikawa ◽  
Taisuke Okuno ◽  
Shuji Kiyohara ◽  
Yoshio Taguchi ◽  
Yoshinari Sugiyama ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Room Temperature ◽  
Hole Transport ◽  
Transport Layer ◽  
Electron Transport Layer ◽  
Insulating Layer ◽  
Light Emitting ◽  
Light Emitting Devices ◽  
Organic Light ◽  
Organic Light Emitting Devices

ABSTRACTOrganic light-emitting devices (OLEDs) have attracted a lot of attention as a next generation display. In this study, we fabricated the micro-OLEDs by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds. The diamond has superior durability and was used as mold material for RTC-NIL. The diamond molds have been fabricated by electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in the electron beam (EB) lithography technology. We fabricated the diamond mold pattern with 10 μm-square dot. The diamond molds have been used to form an insulating layer in micro-OLEDs. The optimum thickness of N,N’-Diphenyl-N,N’-di(m-tolyl)benzidine (TPD) [hole transport layer],Tris(8-quinolinolato)aluminum (Alq3) [electron transport layer] and aluminum (Al) [cathode] were 40 nm, 40 nm and 200 nm, respectively. We succeeded in formation of insulating layer in micro-OLEDs and operation of micro-OLEDs with 10 μm-square-dot by RTC-NIL using diamond molds.

Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography

2007 ◽  
Vol 18 (5) ◽  
pp. 055306 ◽  
Author(s):  
Sang Hoon Kim ◽  
Ki-Dong Lee ◽  
Ja-Yeon Kim ◽  
Min-Ki Kwon ◽  
Seong-Ju Park
Keyword(s):  
Photonic Crystal ◽  
Crystal Structures ◽  
Nanoimprint Lithography ◽  
Light Emitting Diodes ◽  
Light Emitting

Study on Organic Light-Emitting Diode Based Photonic Crystal Substrate Fabricated by Nanoimprint Lithography Technology

2013 ◽  
Vol 785-786 ◽  
pp. 400-405
Author(s):  
Yang Li ◽  
Wei Xu
Keyword(s):  
Photonic Crystal ◽  
Nanoimprint Lithography ◽  
Optical Glass ◽  
Light Emitting Diode ◽  
Gap Effect ◽  
Micro Structure ◽  
Light Emitting ◽  
Organic Light ◽  
Micro Structures ◽  
Lithography Technology

The nanimprint lithography technology was used on the optical glass substrate of organic light-emitting diodes (OLED). By optimizing nanoimprint process 2-dimensional micro-structures were fabricated on the substrate. The parameters of micro-structures such as period, diameter and length were optimized using Finite-difference time-domain (FDTD) and finally, the optical crystal micro-structure with 500nm period, 300nm diameter and 500nm length was fabricated. The basic structure of the devices fabricated on the micro-structure substrate is Glass/ LTO/photonic / ITO/ MoO3/NPB/Alq/LiF/Al. The light outcoupling efficiency can be increased effectively due to the photonic band gap effect produced by photonic crystal structures on the substrate of OLED. The measuring result showed that both the emission spectrum and the light intensity were increased.

Enhanced efficiency of light emitting diodes with a nano-patterned gallium nitride surface realized by soft UV nanoimprint lithography

2010 ◽  
Vol 21 (20) ◽  
pp. 205304 ◽  
Author(s):  
Weimin Zhou ◽  
Guoquan Min ◽  
Zhitang Song ◽  
Jing Zhang ◽  
Yanbo Liu ◽  
...  
Keyword(s):  
Gallium Nitride ◽  
Nanoimprint Lithography ◽  
Light Emitting Diodes ◽  
Light Emitting
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